On the electrical characteristics of the atomic layer deposition Al2O3/In0.53Ga0.47As MOSCAPs with various annealing processes
2018 ◽
Vol 13
(3)
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pp. 1800454
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Keyword(s):
2013 ◽
Vol 31
(1)
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pp. 01A132
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Keyword(s):
2012 ◽
Vol 516-517
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pp. 1945-1948
2015 ◽
Vol 55
(1)
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pp. 016502
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2013 ◽
Vol 210
(7)
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pp. 1381-1385
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2016 ◽
Vol 63
(7)
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pp. 2826-2830
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