Comparative Study on Structural and Electrical Characteristics of TiO2 Film Deposited by Plasma-Enhanced Atomic Layer Deposition and RF Sputtering

2019 ◽  
pp. 507-513
Author(s):  
Rajesh Kumar Jha ◽  
Prashant Singh ◽  
Manish Goswami ◽  
B. R. Singh
Keyword(s):  
Atomic Layer Deposition ◽  
Comparative Study ◽  
Tio2 Film ◽  
Rf Sputtering ◽  
Atomic Layer ◽  
Electrical Characteristics ◽  
Layer Deposition

scholarly journals Comparative study on the use of novel heteroleptic cyclopentadienyl-based zirconium precursors with H2O and O3for atomic layer deposition of ZrO2

2019 ◽  
Vol 37 (2) ◽  
pp. 020912 ◽  
Author(s):  
Sanni Seppälä ◽  
Marko Vehkamäki ◽  
Kenichiro Mizohata ◽  
Wontae Noh ◽  
Jyrki Räisänen ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Comparative Study ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Influence of Oxidant Gas of Atomic Layer Deposition on Electrical Characteristics of Al2O3 films

2018 ◽  
Vol 61 (5) ◽  
pp. 280-285 ◽  
Author(s):  
Toshihide NABATAME ◽  
Masayuki KIMURA ◽  
Kazuya YUGE ◽  
Mari INOUE ◽  
Naoki IKEDA ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Electrical Characteristics ◽  
Layer Deposition

Comparative study on NBTI kinetics in Si p-FinFETs with B2H6-based and SiH4-based atomic layer deposition tungsten (ALD W) filling metal

2020 ◽  
Vol 107 ◽  
pp. 113627 ◽  
Author(s):  
Longda Zhou ◽  
Guilei Wang ◽  
Xiaogen Yin ◽  
Zhigang Ji ◽  
Qianqian Liu ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Comparative Study ◽  
Atomic Layer ◽  
Layer Deposition
Sign in / Sign up

Export Citation Format

Share Document