Point Defect Formation and Diffusion

2002 ◽  
Vol 46 (1) ◽  
pp. 37-41 ◽  
Author(s):  
Hannes Schweiger ◽  
Olga Semenova ◽  
Walter Wolf ◽  
Wolfgang Püschl ◽  
Wolfgang Pfeiler ◽  
...  

2021 ◽  
Vol 130 (12) ◽  
pp. 125702
Author(s):  
Anurag Vohra ◽  
Geoffrey Pourtois ◽  
Roger Loo ◽  
Wilfried Vandervorst

2017 ◽  
Vol 8 ◽  
pp. 85505 ◽  
Author(s):  
Pia Seeberger ◽  
Julien Vidal

Formation entropy of point defects is one of the last crucial elements required to fully describe the temperature dependence of point defect formation. However, while many attempts have been made to compute them for very complicated systems, very few works have been carried out such as to assess the different effects of finite size effects and precision on such quantity. Large discrepancies can be found in the literature for a system as primitive as the silicon vacancy. In this work, we have proposed a systematic study of formation entropy for silicon vacancy in its 3 stable charge states: neutral, +2 and –2 for supercells with size not below 432 atoms. Rationalization of the formation entropy is presented, highlighting importance of finite size error and the difficulty to compute such quantities due to high numerical requirement. It is proposed that the direct calculation of formation entropy of VSi using first principles methods will be plagued by very high computational workload (or large numerical errors) and finite size dependent results.


1991 ◽  
Vol 05 (03) ◽  
pp. 427-459 ◽  
Author(s):  
EDWARD H. CONRAD

The study of defect formation at metal surfaces is a fundamental problem in surface physics. An understanding of defect formation is pertinent to growth and diffusion mechanisms. In addition, surface roughening, faceting, and surface melting are all defect mediated phase transitions involving the formation of different topological defects. While the importance of defects at surfaces is well recognized, the study of surface defects has been hampered by the lack of sufficiently accurate experimental techniques. In fact, it is only in the past 6 years that experiments on the thermal generation of defects on metal surfaces have been performed. This review attempts to outline both the theoretical and experimental work on surface defect formation on metal systems.


1995 ◽  
Vol 408 ◽  
Author(s):  
M. A. Berding ◽  
A. Sher ◽  
M. Van Schilfgaarde

AbstractNative point defect densities (including vacancies, antisites and interstitials) in ZnSe are calculated using a quasichemical formalism, including both vibrational and electronic contributions to the defect free energy. The electronic contribution to the defect formation free energy is calculated using the self-consistent first-principles full-potential linearized muffin-tin orbital (FP-LMTO) method and the local-density approximation (LDA). Gradient corrections are included so that absolute reference to zinc atoms in the vapor phase can be made. We find that the Frenkel defect formation energy is ∼0.3 eV lower at a stacking fault than in the bulk lattice. Nonradiative-recombination-induced Frenkel defect generation at stacking faults is proposed as a mechanism responsible for the limited device lifetimes.


1993 ◽  
Vol 300 ◽  
Author(s):  
W. Walukiewicz

ABSTRACTThe effects of heavy doping on the formation of charged point defects are considered. It is shown that the Fermi level dependent part of the formation energy of highly localized defects can be determined using a universal energy reference, common to all III-V compound semiconductors. The concept is used to analyze the electrical activity and diffusion of dopant impurities in these compounds. We present model calculations which explain the correlation between the maximum hole concentrations and the acceptor impurity diffusion in InP and in InGaAs alloys, doped with group II acceptors. The calculations account for the redistribution of the impurity atoms at the lattice matched InP/InGaAs interface. It is also demonstrated that an abrupt enhancement of the Fermi level induced defect formation is observed at the onset of highly degenerate statistics in heavily doped semiconductors.


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