Critical Dimension Atomic Force Microscopy for Sub-50-nm Microelectronics Technology Nodes

Author(s):  
Hao-Chih Liu ◽  
Gregory A. Dahlen ◽  
Jason R. Osborne
2011 ◽  
Author(s):  
Ndubuisi G. Orji ◽  
Ronald G. Dixson ◽  
András E. Vládar ◽  
Michael T. Postek

2014 ◽  
Vol 64 (11) ◽  
pp. 1643-1647 ◽  
Author(s):  
Yongho Seo ◽  
Jun-Young Park ◽  
K. B. Kim ◽  
Naesung Lee

Author(s):  
N. Dayanand ◽  
A.C.T. Quah ◽  
C.Q. Chen ◽  
S.P. Neo ◽  
G.B. Ang ◽  
...  

Abstract This paper describes the effectiveness of using light induced Current Imaging – Atomic Force Microscopy (CIAFP) to localize defects that are not easily detected through conventional CI-AFP. Defect localization enhancement for both memory and logic failures has been demonstrated. For advanced technology nodes memory failures, current imaging from photovoltaic effects enhanced the detection of bridging between similar types of junctions. Light induced effects also helped to improve the distinction between gated and nongated diode, as a result enhanced localization of gate to source/drain short.


Nano Letters ◽  
2004 ◽  
Vol 4 (7) ◽  
pp. 1301-1308 ◽  
Author(s):  
Qi Ye ◽  
Alan M. Cassell ◽  
Hongbing Liu ◽  
Kuo-Jen Chao ◽  
Jie Han ◽  
...  

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