Surface Characterization of Thin Organic Films on Metals

1985 ◽  
pp. 1-28
Author(s):  
D. M. Hercules
2004 ◽  
Vol 455-456 ◽  
pp. 295-300 ◽  
Author(s):  
M. Schubert ◽  
C. Bundesmann ◽  
G. Jakopic ◽  
H. Maresch ◽  
H. Arwin ◽  
...  

Author(s):  
Katy Roodenko ◽  
Damien Aureau ◽  
Florent Yang ◽  
Peter Thissen ◽  
Jörg Rappich

1991 ◽  
Vol 103 (1-2) ◽  
pp. 3-35 ◽  
Author(s):  
Paul W. Bohn ◽  
Dennis J. Walls

2008 ◽  
Vol 23 (7) ◽  
pp. 1931-1939 ◽  
Author(s):  
María Arroyo-Hernández ◽  
José Pérez-Rigueiro ◽  
Ana Conde ◽  
Aurelio Climent ◽  
Raul Gago ◽  
...  

A novel technique based in the combination of vapor silanization and chemical vapor deposition, hereafter referred to as activated vapor silanization (AVS), is shown to be an effective biofunctionalization technique. The AVS process results in thin organic films with a high surface amine concentration when deposited on substrates with different chemical characteristics, such as silicon, porous silicon, or gold. Chemical characterization shows that the films are composed of carbon (hydrocarbon, C–Si, C–C), silicon (different oxidation states), nitrogen (primary and secondary amines), oxygen, and hydrogen. Relevantly, the amines are also distributed along the film thickness, ensuring functionality even after some degradation of the films. AVS films behave practically as monocrystalline silicon substrates under loading–unloading tests. In addition, the AVS films behave as permeable membranes for molecules smaller than 5 Å, and the amine surface concentration is estimated to be 8 NH2/nm2 for molecules of about 12 Å, which is three times higher than that obtained with standard silanization procedures.


Author(s):  
Katy Roodenko ◽  
Damien Aureau ◽  
Florent Yang ◽  
Peter Thissen ◽  
Jörg Rappich

Author(s):  
R. E. Herfert

Studies of the nature of a surface, either metallic or nonmetallic, in the past, have been limited to the instrumentation available for these measurements. In the past, optical microscopy, replica transmission electron microscopy, electron or X-ray diffraction and optical or X-ray spectroscopy have provided the means of surface characterization. Actually, some of these techniques are not purely surface; the depth of penetration may be a few thousands of an inch. Within the last five years, instrumentation has been made available which now makes it practical for use to study the outer few 100A of layers and characterize it completely from a chemical, physical, and crystallographic standpoint. The scanning electron microscope (SEM) provides a means of viewing the surface of a material in situ to magnifications as high as 250,000X.


1995 ◽  
Vol 189 (Part_2) ◽  
pp. 276-276
Author(s):  
H.-D. Dörfler

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