Preparation of Thin-Film Oxide Superconductor, Y1Ba2Cu3O7−δ by Facing Target Sputtering Deposition Technique

Highly-uniform In2O3/CuO bilayer and multilayer porous thin films were successfully fabricated using a self-assembled soft template and a simple sputtering deposition technique.

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Investigation of Cu2ZnSnS4 thin film with preannealing process and ZnS buffer layer prepared by magnetron sputtering deposition

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2021.161015 ◽

2021 ◽

pp. 161015

Author(s):

Wei-Sheng Liu ◽

Chien-Sheng Huang ◽

Shih-Yuan Chen ◽

Ming-Yuan Lee ◽

Hsing-Chun Kuo

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Buffer Layer ◽

Sputtering Deposition ◽

Cu2znsns4 Thin Film

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Structural, chemical and magnetic properties of nickel vertical posts obtained by glancing angle deposition technique

Science of Sintering ◽

10.2298/sos1701073p ◽

2017 ◽

Vol 49 (1) ◽

pp. 73-79

Author(s):

Jelena Potocnik ◽

Milos Nenadovic ◽

Bojan Jokic ◽

Maja Popovic ◽

Zlatko Rakocevic

Keyword(s):

Thin Film ◽

Magnetic Properties ◽

Photoelectron Spectroscopy ◽

Glancing Angle Deposition ◽

Deposition Technique ◽

Force Microscopy ◽

Atomic Force ◽

Glancing Angle ◽

Magneto Optical Kerr Effect ◽

Angle Deposition

In this work, Glancing Angle Deposition technique was used for obtaining nanostructured nickel thin film with vertical posts on glass substrate which was positioned 75 degrees with respect to the substrate normal and rotated with a suitable constant speed. The obtained nickel thin film was characterized by Scanning Electron Microscopy, Atomic Force Microscopy and X-ray Photoelectron Spectroscopy. It was found that the deposited thin film consists of 94.0 at.% of nickel. Magnetic properties of the deposited thin film were determined by Magneto-Optical Kerr Effect Microscopy. According to the obtained coercivity values, it can be concluded that the nickel thin film shows uniaxial magnetic anisotropy.

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Formation of a thin film of poly(octadecyl methacrylate) using the physical vapour deposition technique

Polymer ◽

10.1016/0032-3861(91)90174-h ◽

1991 ◽

Vol 32 (11) ◽

pp. 2064-2069 ◽

Cited By ~ 12

Author(s):

Masao Tamada ◽

Masaharu Asano ◽

Masaru Yoshida ◽

Minoru Kumakura

Keyword(s):

Thin Film ◽

Vapour Deposition ◽

Physical Vapour Deposition ◽

Deposition Technique

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Sculptured thin film vanadium dioxide thermochromic coatings grown by oblique angle deposition: investigation of transmittance response and modulation enhancement by experiment and theoretical modeling

Journal of Materials Chemistry C ◽

10.1039/d1tc02649f ◽

2021 ◽

Vol 9 (38) ◽

pp. 13304-13320

Author(s):

Saranya Bhupathi ◽

Mohammad Abutoama ◽

Yi Long ◽

Ibrahim Abdulhalim

Keyword(s):

Thin Film ◽

Heat Treatment ◽

Vanadium Dioxide ◽

Theoretical Modeling ◽

Optical Measurements ◽

Oblique Angle Deposition ◽

Oblique Angle ◽

Smart Window ◽

Sputtering Deposition ◽

Angle Deposition

Fabrication of STF VO2 by an industrially viable sputtering deposition following heat-treatment, and optical measurements for thermochromic smart window application.

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Growth of Thin Films by UHV ION Beam Sputtering Deposition Technique

Erosion and Growth of Solids Stimulated by Atom and Ion Beams ◽

10.1007/978-94-009-4422-0_30 ◽

1986 ◽

pp. 457-460 ◽

Cited By ~ 1

Author(s):

C. Pellet ◽

C. Schwebel ◽

F. Meyer ◽

G. Gautherin

Keyword(s):

Thin Films ◽

Ion Beam ◽

Deposition Technique ◽

Ion Beam Sputtering ◽

Sputtering Deposition ◽

Beam Sputtering

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Spray Pyrolysis Thin Film Deposition Technique for Micro-Sensors and Devices

Advances in Systems Analysis, Software Engineering, and High Performance Computing - Advancements in Instrumentation and Control in Applied System Applications ◽

10.4018/978-1-7998-2584-5.ch011 ◽

2020 ◽

pp. 178-202

Author(s):

Monoj Kumar Singha ◽

Vineet Rojwal

Keyword(s):

Thin Film ◽

Spray Pyrolysis ◽

Thin Film Deposition ◽

Deposition Process ◽

Film Deposition ◽

Deposition Technique ◽

Uv Photodetector ◽

Spray Process ◽

Spray Pyrolysis Deposition ◽

Deposition Techniques

Thin film is used for sensing and electronic devices applications. Various techniques are used for thin film deposition. This chapter presents the Spray pyrolysis deposition technique used for the growth of thin films sensing and device material. Spray pyrolysis is an inexpensive method to grow good crystalline thin film compared to other thin film deposition techniques. The chapter gives an overview of the spray process used for thin film deposition. Basic setup for this process is explained. Parameters affecting the deposition process is explained, as are the various spray methods. Finally, some examples of spray pyrolysis in different applications like a gas sensor, UV photodetector, solar cell, photocatalysis, and supercapacitor are discussed.

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