Diamond-like carbon films prepared from CH4-H2-H2O mixed gas using a microwave plasma

1989 ◽  
Vol 24 (1) ◽  
pp. 293-297 ◽  
Author(s):  
Yukio Saito ◽  
Kouji Sato ◽  
Hideaki Tanaka ◽  
Hiroshi Miyadera
Keyword(s):  
Microwave Plasma ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Mixed Gas

Role of microstructure on the oxidation behavior of microwave plasma synthesized diamond and diamond-like carbon films

1990 ◽  
Vol 5 (11) ◽  
pp. 2445-2450 ◽  
Author(s):  
Rao R. Nimmagadda ◽  
A. Joshi ◽  
W. L. Hsu
Keyword(s):  
Oxidation Behavior ◽  
Microwave Plasma ◽  
Natural Diamond ◽  
Diamond Films ◽  
Cvd Diamond ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Gravimetric Analysis ◽  
Oxidation Rates

Oxidation kinetics of microwave plasma assisted CVD diamond and diamond-like carbon (DLC) films in flowing oxygen were evaluated in the temperature range of 500 to 750 °C and were compared with those of graphite and natural diamond. The diamond and DLC films were prepared using CH4/H2 ratios of 0.1, 0.25, 0.5, 1.0, and 2.0%. The films deposited at 0.1% ratio had a faceted crystalline structure with high sp3 content and as the ratio increased toward 2%, the films contained more and more fine crystalline sp2 bonded carbon. The oxidation rates were determined by thermal gravimetric analysis (TGA), which shows that the films deposited at ratios of 2, 1, and 0.5% oxidized at high rates and lie between the rates of natural diamond and graphite. The oxidation rate decreased with lower CH4/H2 ratio and the films deposited at 0.25 and 0.1% exhibited the lowest oxidation rates associated with the highest activation energies in the range of 293–285 kJ/mol · K. The oxidation behavior of microwave plasma assisted diamond films was similar to that of DC plasma assisted CVD diamond films. The results suggest that the same mechanism of oxidation is operational in both DC and microwave plasma assisted diamond films and is probably related to the microstructure and preferred orientation of the crystallites.

Structural and mechanical characterization of diamond like carbon films grown by microwave plasma CVD

2010 ◽  
Vol 204 (16-17) ◽  
pp. 2817-2821 ◽  
Author(s):  
Sambita Sahoo ◽  
Swati S. Pradhan ◽  
Venkateswarlu Bhavanasi ◽  
S.K. Pradhan
Keyword(s):  
Mechanical Characterization ◽  
Microwave Plasma ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd

Pretreatment Study on the Deposition of Diamond-Like Carbon Films on Quartz by Star-Shape MPCVD Reactor

2014 ◽  
Vol 912-914 ◽  
pp. 288-292
Author(s):  
Li Wei Xiong ◽  
Guo Hua Gong ◽  
Jian Hua Wang ◽  
Xiao Hui Cui ◽  
Wei Zou
Keyword(s):  
Microwave Plasma ◽  
Chemical Vapor ◽  
Diamond Powder ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Pretreatment Time ◽  
Infrared Spectrometer ◽  
Optical Applications ◽  
The Fourier Transform ◽  
Quartz Substrates

Diamond-Like Carbon (DLC) films were deposited on quartz substrates by using a gas mixture of hydrogen-methane-oxygen in the Star-Shape Microwave Plasma enhanced Chemical Vapor Deposition (MPCVD) reactor. The pretreatment parameters include the pretreatment methods and the pretreatment time was optimized. Results showed that ultrasonically abrasive in the acetone solution with nanocrystalline diamond powder in it was an efficient pretreatment method to advance the deposition of DLC films, and 10 minute turned to be the most appropriate time for this pretreatment. The Fourier Transform Infrared spectrometer (FTIR) showed that the DLC films synthesized by the optimized technics have high transparence fit for optical applications. These indicated that the Star-Shape MPCVD reactor was the perfect equipment for the volume-produce of DLC films for its unique big reactive cavity.

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