Kinetics of the formation of concentrational transitions between epitaxial layers of silicon in the process of growth from a molecular beam

1982 ◽  
Vol 25 (11) ◽  
pp. 983-985
Author(s):  
M. I. Obsyannikov ◽  
R. G. Loginova ◽  
S. D. Tsarevskii

2004 ◽  
Vol 84 (18) ◽  
pp. 3684-3686 ◽  
Author(s):  
E. Monroy ◽  
E. Sarigiannidou ◽  
F. Fossard ◽  
N. Gogneau ◽  
E. Bellet-Amalric ◽  
...  


1992 ◽  
Vol 280 ◽  
Author(s):  
J. F. Egler ◽  
N. Otsuka ◽  
K. Mahalingam

ABSTRACTGrowth kinetics on non-singular surfaces were studied by Monte Carlo simulations. In contrast to the growth on singular and vicinal surfaces, the sticking coefficient on the non-singular surfaces was found to decrease with increase of the surface roughness. Simulations of annealing processes showed that surface diffusion of atoms leads to a stationary surface roughness, which is explained by multiple configurations having the lowest energy in the non-singular surface.



1987 ◽  
Vol 94 ◽  
Author(s):  
S. B. Ogale ◽  
M. Thomsen ◽  
A. Madhukar

ABSTRACTComputer simulations of III-V molecular beam epitaxy (MBE) show that surface reconstruction induced modulation of kinetic rates could give rise to ordering in alloys. Results are also presented for the possible influence of an external ion beam in achieving low temperature epitaxy as well as smoother growth front under usual conditions.



1995 ◽  
Vol 24 (9) ◽  
pp. 1211-1218 ◽  
Author(s):  
P. S. Wijewarnasuriya ◽  
M. D. Langer ◽  
S. Sivananthan ◽  
J. P. Faurie


1993 ◽  
Vol 283 (1-3) ◽  
pp. 64-69 ◽  
Author(s):  
Kouichi Sugiyama ◽  
Yoshiyuki Igari ◽  
Isao Kusunoki






2010 ◽  
Vol 56 (3) ◽  
pp. 827-831 ◽  
Author(s):  
Jae-Young Leem ◽  
Min Su Kim ◽  
Ghun Sik Kim ◽  
Min Young Cho ◽  
Do Yeob Kim ◽  
...  


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