Combined effect of temperature and pressure on the behavior of long-period ordered structures

1989 ◽  
Vol 32 (12) ◽  
pp. 969-973
Author(s):  
A. I. Potekaev ◽  
L. D. Bynkova
Keyword(s):  
Combined Effect ◽  
Effect Of Temperature ◽  
Ordered Structures ◽  
Long Period ◽  
Temperature And Pressure

Effect of temperature and pressure on mixed oxide solid solutions

2020 ◽  
Vol 117 ◽  
pp. 107965
Author(s):  
M.Yu. Petrushina ◽  
E.S. Dedova ◽  
K.V. Yusenko ◽  
A.S. Portnyagin ◽  
E.K. Papynov ◽  
...  
Keyword(s):  
Solid Solutions ◽  
Mixed Oxide ◽  
Effect Of Temperature ◽  
Temperature And Pressure

scholarly journals Combined effect of temperature and salinity on osmoregulation of juvenile and subadult Penaeus stylirostris

Aquaculture ◽  
2002 ◽  
Vol 209 (1-4) ◽  
pp. 307-317 ◽  
Author(s):  
P Lemaire ◽  
E Bernard ◽  
J.A Martinez-Paz ◽  
L Chim
Keyword(s):  
Combined Effect ◽  
Effect Of Temperature

SOLUBILITY OF ETHYLENE IN WATER. EFFECT OF TEMPERATURE AND PRESSURE

1952 ◽  
Vol 44 (1) ◽  
pp. 211-212 ◽  
Author(s):  
E. J. Bradbury ◽  
Dorothy McNulty ◽  
R. I. Savage ◽  
E. E. McSweeney
Keyword(s):  
Effect Of Temperature ◽  
Water Effect ◽  
Temperature And Pressure

The Effect of Temperature and Pressure on Residual Stress in LPCVD Polysilicon Films

1992 ◽  
Vol 276 ◽  
Author(s):  
D-G. Oei ◽  
S. L. McCarthy
Keyword(s):  
Residual Stress ◽  
Deposition Temperature ◽  
Polycrystalline Silicon ◽  
Chemical Vapor ◽  
Effect Of Temperature ◽  
Pressure Chemical ◽  
Polysilicon Films ◽  
Oriented Polycrystalline ◽  
Temperature And Pressure ◽  
Reduced Pressures

ABSTRACTMeasurements of the residual stress in polysilicon films made by Low Pressure Chemical Vapor Deposition (LPCVD) at different deposition pressures and temperatures are reported. The stress behavior of phosphorus (P)-ion implanted/annealed polysilicon films is also reported. Within the temperature range of deposition, 580 °C to 650 °C, the stress vs deposition temperature plot exhibits a transition region in which the stress of the film changes from highly compressive to highly tensile and back to highly compressive as the deposition temperature increases. This behavior was observed in films that were made by the LPCVD process at reduced pressures of 210 and 320 mTORR. At deposition temperatures below 590 °C the deposit is predominantly amorphous, and the film is highly compressive; at temperatures above 610 °C (110) oriented polycrystalline silicon is formed exhibiting high compressive residual stress.

Synergetic effect of temperature and pressure on energetic and structural characteristics of {ZIF-8 + water} molecular spring

Nanoscale ◽  
2015 ◽  
Vol 7 (19) ◽  
pp. 8803-8810 ◽  
Author(s):  
Ya. Grosu ◽  
G. Renaudin ◽  
V. Eroshenko ◽  
J.-M. Nedelec ◽  
J.-P. E. Grolier
Keyword(s):  
Structural Characteristics ◽  
Synergetic Effect ◽  
Effect Of Temperature ◽  
Temperature And Pressure
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