A survey of ion implantation techniques for enhanced property modification for tailored materials

1998 ◽  
Vol 14 (3) ◽  
pp. 153-159 ◽  
Author(s):  
T. A. Rao ◽  
T. V. Karthikeyan
Vacuum ◽  
2021 ◽  
Vol 187 ◽  
pp. 110105
Author(s):  
I.V. Vasenina ◽  
O.A. Laput ◽  
I.A. Kurzina

2020 ◽  
Vol 388 ◽  
pp. 125529 ◽  
Author(s):  
I.A. Kurzina ◽  
O.A. Laput ◽  
D.A. Zuza ◽  
I.V. Vasenina ◽  
M.C. Salvadori ◽  
...  

Vacuum ◽  
2011 ◽  
Vol 85 (12) ◽  
pp. 1125-1129 ◽  
Author(s):  
J.A. García ◽  
R.J. Rodríguez

1988 ◽  
Vol 36 (1-2) ◽  
pp. 27-36 ◽  
Author(s):  
J.G. Smeggil ◽  
A.J. Shuskus ◽  
C.T. Burilla ◽  
R.J. Cipolli

2004 ◽  
Vol 43 (8A) ◽  
pp. 5562-5563 ◽  
Author(s):  
Isao Sakaguchi ◽  
Syunichi Hishita ◽  
Hajime Haneda

2001 ◽  
Vol 15 (28n29) ◽  
pp. 1321-1327
Author(s):  
C. B. FRANKLYN ◽  
G. NOTHNAGEL

Considerable development work has taken place in the novel technique of plasma source ion implantation (PSII) for the purpose improving the tribological properties of metal surfaces. Original studies involved using nitrogen plasmas to implant nitrogen ions into irregular shaped surfaces. More recently heavy ions have also been implanted. The advantages of the process over conventional ion implantation techniques are numerous, however one distinct disadvantage was the fact that the target had to be conductive, since it acted as the cathode of the system. We report here on a technique to overcome this problem, especially when implanting heavy ions into an insulator material of small dimensions (1-3 mm across) using the PSII system. Also reported are IBA techniques employed to characterize the implantation profile.


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