Process study of thermal plasma chemical vapor deposition of diamond, part II: Pressure dependence and effect of substrate pretreatment

Pressure Dependence ◽

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Process Study ◽

Substrate Pretreatment

Process study of thermal plasma chemical vapor deposition of diamond, part I: Substrate material, temperature, and methane concentration

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01447943 ◽

1992 ◽

Vol 12 (1) ◽

pp. 35-53 ◽

Cited By ~ 49

Author(s):

Z. P. Lu ◽

J. Heberlein ◽

E. Pfender

Keyword(s):

Thermal Plasma ◽

Vapor Deposition ◽

Methane Concentration ◽

Chemical Vapor ◽

Substrate Material ◽

Plasma Chemical ◽

Process Study ◽

Material Temperature

Temperature mapping of reactive gas layer in thermal plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.365687 ◽

1997 ◽

Vol 82 (7) ◽

pp. 3560-3566 ◽

Cited By ~ 4

Author(s):

Jussi Larjo ◽

Joachim Walewski ◽

Rolf Hernberg

Keyword(s):

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Temperature Mapping ◽

Gas Layer ◽

Reactive Gas

Two-dimensional model for thermal plasma chemical vapor deposition

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01512627 ◽

1995 ◽

Vol 16 (S1) ◽

pp. S57-S69 ◽

Cited By ~ 11

Author(s):

D. Kolman ◽

J. Heberlein ◽

E. Pfender ◽

R. Young

Keyword(s):

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Two Dimensional ◽

Dimensional Model ◽

Plasma Chemical ◽

Two Dimensional Model

The effects of substrate rotation on thermal plasma chemical vapor deposition of diamond

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01176-8 ◽

2001 ◽

Vol 142-144 ◽

pp. 724-732 ◽

Cited By ~ 5

Author(s):

M. Asmann ◽

C.F.M. Borges ◽

J. Heberlein ◽

E. Pfender

Keyword(s):

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Substrate Rotation

Diamond deposition on tungsten wires by cyclic thermal plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.359928 ◽

1995 ◽

Vol 78 (5) ◽

pp. 3540-3542 ◽

Cited By ~ 1

Author(s):

Huaqing Yin ◽

Keisuke Eguchi ◽

Toyonobu Yoshida

Keyword(s):

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Diamond Deposition ◽

Thermal Plasma Chemical Vapor Deposition of SiC.

ISIJ International ◽

10.2355/isijinternational.35.1381 ◽

1995 ◽

Vol 35 (11) ◽

pp. 1381-1387 ◽

Cited By ~ 5

Author(s):

Yoshitaka Kojima ◽

Yasutaka Andoo ◽

Masayuki Doi

Keyword(s):

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

New insights in microcrystalline silicon deposition with expanding thermal plasma chemical vapor deposition

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2005.11.109 ◽

2006 ◽

Vol 352 (9-20) ◽

pp. 933-936 ◽

Cited By ~ 3

Author(s):

R.A.C.M.M. van Swaaij ◽

R. Jiménez Zambrano ◽

C. Smit ◽

M.C.M. van de Sanden

Keyword(s):

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Silicon Deposition ◽

CH3OH Concentration and Total Pressure Dependence of Diamond Films Formed from CH3OH-H2Mixed Gas by Magnet-Active Microwave Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.3231 ◽

1993 ◽

Vol 32 (Part 1, No. 7) ◽

pp. 3231-3236 ◽

Cited By ~ 7

Author(s):

Masaya Kadono ◽

Tohru Inoue ◽

Akiharu Miyanaga ◽

Shumpei Yamazaki

Keyword(s):

Pressure Dependence ◽

Vapor Deposition ◽

Total Pressure ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Pressure dependence of morphology and phase composition of SiC films deposited by microwave plasma chemical vapor deposition on cemented carbide substrates

Thin Solid Films ◽

10.1016/j.tsf.2011.01.412 ◽

2011 ◽

Vol 520 (2) ◽

pp. 828-832 ◽

Cited By ~ 12

Author(s):

Sheng-Wang Yu ◽

Peng-Wei Fan ◽

Wei-Zhong Tang ◽

Xiao-Jing Li ◽

Hao-Lin Hu ◽

...

Keyword(s):

Phase Composition ◽

Pressure Dependence ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Cemented Carbide ◽

Plasma Chemical ◽

Sic Films

Influence of deposition parameters on diamond thermal plasma chemical vapor deposition with liquid feedstock injection

Diamond and Related Materials ◽

10.1016/s0925-9635(98)90323-5 ◽

1998 ◽

Vol 7 (6) ◽

pp. 794-801 ◽

Cited By ~ 4

Author(s):

D. Kolman ◽

J. Heberlein ◽

E. Pfender

Keyword(s):

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Deposition Parameters ◽

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