Influence of the cap layer thickness on photoluminescence properties in strained InGaAs/GaAs single quantum wells

1994 ◽  
Vol 15 (10) ◽  
pp. 1643-1650 ◽  
Author(s):  
W. Z. Shen ◽  
W. G. Tang ◽  
S. C. Shen ◽  
S. M. Wang ◽  
T. Anderson
1994 ◽  
Vol 9 (6) ◽  
pp. 1230-1233 ◽  
Author(s):  
S M Wang ◽  
T G Andersson ◽  
Z H Lai ◽  
J V Thordson

1994 ◽  
Vol 65 (3) ◽  
pp. 336-337 ◽  
Author(s):  
S. M. Wang ◽  
J. V. Thordson ◽  
T. G. Andersson ◽  
S. Jiang ◽  
L. X. Yang ◽  
...  

2020 ◽  
Vol 15 (1) ◽  
Author(s):  
Xiaowei Wang ◽  
Feng Liang ◽  
Degang Zhao ◽  
Zongshun Liu ◽  
Jianjun Zhu ◽  
...  

Abstract Three InGaN/GaN MQWs samples with varying GaN cap layer thickness were grown by metalorganic chemical vapor deposition (MOCVD) to investigate the optical properties. We found that a thicker cap layer is more effective in preventing the evaporation of the In composition in the InGaN quantum well layer. Furthermore, the quantum-confined Stark effect (QCSE) is enhanced with increasing the thickness of GaN cap layer. In addition, compared with the electroluminescence measurement results, we focus on the difference of localization states and defects in three samples induced by various cap thickness to explain the anomalies in room temperature photoluminescence measurements. We found that too thin GaN cap layer will exacerbates the inhomogeneity of localization states in InGaN QW layer, and too thick GaN cap layer will generate more defects in GaN cap layer.


2015 ◽  
Vol 117 (5) ◽  
pp. 055709 ◽  
Author(s):  
J. Yang ◽  
D. G. Zhao ◽  
D. S. Jiang ◽  
P. Chen ◽  
J. J. Zhu ◽  
...  

1991 ◽  
Vol 58 (8) ◽  
pp. 854-855 ◽  
Author(s):  
M. J. Ekenstedt ◽  
S. M. Wang ◽  
T. G. Andersson

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