A device for sublimation molecular beam deposition of erbium-doped silicon films

2000 ◽  
Vol 43 (4) ◽  
pp. 564-565
Author(s):  
S. P. Svetlov ◽  
V. Yu. Chalkov ◽  
V. G. Shengurov
Keyword(s):  
Molecular Beam ◽  
Silicon Films ◽  
Molecular Beam Deposition ◽  
Erbium Doped ◽  
Doped Silicon ◽  
Beam Deposition

Molecular beam deposition of high quality silicon oxide dielectric films

1995 ◽  
Vol 148 (4) ◽  
pp. 336-344 ◽  
Author(s):  
Naresh Chand ◽  
J.E. Johnson ◽  
J.W. Osenbach ◽  
W.C. Liang ◽  
L.C. Feldman ◽  
...  
Keyword(s):  
Molecular Beam ◽  
Silicon Oxide ◽  
Dielectric Films ◽  
High Quality ◽  
Molecular Beam Deposition ◽  
Beam Deposition

Ozone-enhanced molecular beam deposition of nickel oxide (NiO) for sensor applications

1997 ◽  
Vol 310 (1-2) ◽  
pp. 19-23 ◽  
Author(s):  
Alexandra Neubecker ◽  
Thomas Pompl ◽  
Theodor Doll ◽  
Walter Hansch ◽  
Ignaz Eisele
Keyword(s):  
Nickel Oxide ◽  
Molecular Beam ◽  
Sensor Applications ◽  
Molecular Beam Deposition ◽  
Beam Deposition

Heteroepitaxial properties of Si1−x−yGexCy on Si(100) grown by combined ion- and molecular-beam deposition

1997 ◽  
Vol 81 (7) ◽  
pp. 3081-3091 ◽  
Author(s):  
Harald Jacobsson ◽  
Joan Xiang ◽  
Nicole Herbots ◽  
Shawn Whaley ◽  
Peihua Ye ◽  
...  
Keyword(s):  
Molecular Beam ◽  
Molecular Beam Deposition ◽  
Beam Deposition

scholarly journals Controlling the Early Stages of Pentacene Growth by Supersonic Molecular Beam Deposition

2007 ◽  
Vol 98 (7) ◽  
Author(s):  
Yu Wu ◽  
Tullio Toccoli ◽  
Norbert Koch ◽  
Erica Iacob ◽  
Alessia Pallaoro ◽  
...  
Keyword(s):  
Molecular Beam ◽  
Supersonic Molecular Beam ◽  
Early Stages ◽  
Molecular Beam Deposition ◽  
Beam Deposition

Structural and Optical Properties of In-Plane Ordered Metallo-Phthalocyanine Thin Films Formed on Sapphire by Organic Molecular Beam Deposition

1995 ◽  
Vol 34 (Part 1, No. 7B) ◽  
pp. 3884-3888 ◽  
Author(s):  
Takayoshi Hayashi ◽  
Tohru Maruno ◽  
Akira Yamashita ◽  
Stefan Fölsch ◽  
Hirohisa Kanbara ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Molecular Beam ◽  
Structural And Optical Properties ◽  
Molecular Beam Deposition ◽  
Beam Deposition

scholarly journals Synthesis, spectroscopic characterization and thermogravimetric analysis of two series of substituted (metallo)tetraphenylporphyrins

2017 ◽  
Vol 8 ◽  
pp. 1191-1204 ◽  
Author(s):  
Rasha K Al-Shewiki ◽  
Carola Mende ◽  
Roy Buschbeck ◽  
Pablo F Siles ◽  
Oliver G Schmidt ◽  
...  
Keyword(s):  
Thermogravimetric Analysis ◽  
Molecular Beam ◽  
Elevated Temperatures ◽  
Oxalyl Chloride ◽  
Spectroscopic Characterization ◽  
Subsequent Treatment ◽  
Ionization Mass ◽  
Molecular Beam Deposition ◽  
Vis Spectroscopy ◽  
Beam Deposition

Subsequent treatment of H2TPP(CO2H)4 (tetra(p-carboxylic acid phenyl)porphyrin, 1) with an excess of oxalyl chloride and HNR2 afforded H2TPP(C(O)NR2)4 (R = Me, 2; iPr, 3) with yields exceeding 80%. The porphyrins 2 and 3 could be converted to the corresponding metalloporphyrins MTPP(C(O)NR2)4 (R = Me/iPr for M = Zn (2a, 3a); Cu (2b, 3b); Ni (2c, 3c); Co (2d, 3d)) by the addition of 3 equiv of anhydrous MCl2 (M = Zn, Cu, Ni, Co) to dimethylformamide solutions of 2 and 3 at elevated temperatures. Metalloporphyrins 2a–d and 3a–d were obtained in yields exceeding 60% and have been, as well as 2 and 3, characterized by elemental analysis, electrospray ionization mass spectrometry (ESIMS) and IR and UV–vis spectroscopy. Porphyrins 2, 2a–d and 3, 3a–d are not suitable for organic molecular beam deposition (OMBD), which is attributed to their comparatively low thermal stability as determined by thermogravimetric analysis (TG) of selected representatives.

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