Role of columnar grain size in magnetization of La0.8MnO3 thin films grown by pulsed laser deposition

2005 ◽  
Vol 81 (7) ◽  
pp. 1423-1426 ◽  
Author(s):  
C.C. Wang ◽  
H. Wang ◽  
X. Zheng ◽  
J. Zhu
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Columnar Grain

Role of vanadium content in ZnO thin films grown by pulsed laser deposition

2007 ◽  
Vol 254 (4) ◽  
pp. 1228-1231 ◽  
Author(s):  
M.E. Koleva ◽  
P.A. Atanasov ◽  
N.N. Nedialkov ◽  
H. Fukuoka ◽  
M. Obara
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Vanadium Content ◽  
Laser Deposition ◽  
Zno Thin Films

Role of oxygen pressure in growth of CeAlOx thin films on Si by pulsed laser deposition

2003 ◽  
Vol 94 (1) ◽  
pp. 594-597 ◽  
Author(s):  
L. Yan ◽  
L. B. Kong ◽  
J. S. Pan ◽  
C. K. Ong
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Oxygen Pressure ◽  
Pulsed Laser ◽  
Laser Deposition

Pulsed Laser Deposition Thin Films of Pr0.7Sr0.3MnO3:  The Role of Growth Temperature

2000 ◽  
Vol 12 (10) ◽  
pp. 2858-2868 ◽  
Author(s):  
B. Mercey ◽  
J. Wolfman ◽  
W. Prellier ◽  
M. Hervieu ◽  
Ch. Simon ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Growth Temperature ◽  
Pulsed Laser ◽  
Laser Deposition

Growth of Textured Nanocrystalline Cobalt Ferrite Thin Films by Pulsed Laser Deposition

2008 ◽  
Vol 8 (8) ◽  
pp. 4135-4140 ◽  
Author(s):  
Lakshmikanta Aditya ◽  
A. Srivastava ◽  
S. K. Sahoo ◽  
P. Das ◽  
C. Mukherjee ◽  
...  
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Pulsed Laser Deposition ◽  
Cobalt Ferrite ◽  
Pulsed Laser ◽  
Grazing Incidence ◽  
Orientation Distribution ◽  
Laser Deposition ◽  
X Ray ◽  
Ferrite Thin Films

Cobalt ferrite thin films have been deposited on fused quartz substrates by pulsed laser deposition at various substrate temperatures, TS (25 °C, 300 °C, 550 °C and 750 °C). Single phase, nanocrystalline, spinel cobalt ferrite formation is confirmed by X-ray diffraction (XRD) for TS ≥ 300 °C. Conventional XRD studies reveal strong (111) texturing in the as deposited films with TS ≥ 550 °C. Bulk texture measurements using X-ray orientation distribution function confirmed (111) preferred orientation in the films with TS ≥ 550 °C. Grain size (13–16 nm for TS ≥ 300 °C) estimation using grazing incidence X-ray line broadening analysis shows insignificant grain growth with increasing TS, which is in good agreement with grain size data obtained from transmission electron microscopy.

scholarly journals Pulsed laser deposition of SrRuO3 thin-films: The role of the pulse repetition rate

APL Materials ◽  
2016 ◽  
Vol 4 (12) ◽  
pp. 126109 ◽  
Author(s):  
H. Schraknepper ◽  
C. Bäumer ◽  
F. Gunkel ◽  
R. Dittmann ◽  
R. A. De Souza
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Repetition Rate ◽  
Pulse Repetition Rate ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Pulse Repetition

Grain size, texture, and crystallinity in lanthanum monosulfide thin films grown by pulsed laser deposition

2012 ◽  
Vol 524 ◽  
pp. 166-172 ◽  
Author(s):  
S. Fairchild ◽  
M. Cahay ◽  
P.T. Murray ◽  
L. Grazulis ◽  
X. Wu ◽  
...  
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Lanthanum Monosulfide

Novel Nanocrystalline Materials by Pulsed Laser Deposition

2000 ◽  
Vol 617 ◽  
Author(s):  
J. Narayan ◽  
A.K. Sharma ◽  
A. Kvit ◽  
D. Kumar ◽  
J.F. Muth
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Grain Boundary Sliding ◽  
Laser Deposition ◽  
Nanocrystalline Metal ◽  
Potential Applications ◽  
Novel Method ◽  
Boundary Sliding

AbstractWe have developed a novel method based upon pulsed laser deposition to produce nanocrystalline metal, semiconductor and magnetic material thin films and composites. The size of nanocrystals was controlled by interfacial energy, number of monolayers and substrate temperature. By incorporating a few monolayers of W during PLD, the grain size of copper nanocrystals was reduced from 160nm (Cu on Si (100)) to 4nm for a multilayer (Cu/W/Cu/W/Si (100)) thin film. The hardness increased with decreasing grain size up to a certain value (7nm in the case of copper) and then decreased below this value. While the former is consistent with Hall-Petch model, the latter involves a new model based upon grain boundary sliding.We have used the same PLD approach to form nanocrystalline metal (Ni, Co, Fe embedded in α-A12O3 and MgO) and semiconductor (Si, Ge, ZnO, GaN embedded in AIN and α-A12O3) thin films. These nanocrystalline composites exhibit novel magnetic properties and novel optoelectronic properties with quantum confinement of electrons, holes and excitons in semiconductors. We review advanced PLD processing, detailed characterization, structureproperty correlations and potential applications of these materials.

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