Correlation between electrical transport, microstructure and room temperature ferromagnetism in 200 keV Ni2+ ion implanted zinc oxide (ZnO) thin films

2012 ◽  
Vol 107 (2) ◽  
pp. 393-400 ◽  
Author(s):  
B. Joshi ◽  
S. Ghosh ◽  
P. Srivastava ◽  
P. Kumar ◽  
D. Kanjilal
2015 ◽  
Vol 117 (17) ◽  
pp. 17B901 ◽  
Author(s):  
Yu-Min Hu ◽  
Sih-Sian Li ◽  
Chein-Hsiun Kuang ◽  
Tai-Chun Han ◽  
Chin-Chung Yu

2007 ◽  
Vol 102 (3) ◽  
pp. 033905 ◽  
Author(s):  
D. L. Hou ◽  
X. J. Ye ◽  
X. Y. Zhao ◽  
H. J. Meng ◽  
H. J. Zhou ◽  
...  

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
M. Acosta ◽  
I. Riech ◽  
E. Martín-Tovar

Zinc oxide (ZnO) thin films were grown by nonreactive RF sputtering at room temperature under varying argon pressures (PAr). Their optical band gap was found to increase from 3.58 to 4.34 eV when the argon pressure increases from 2.67 to 10.66 Pa. After annealing at 200°C and 500°C, optical band gaps decrease considerably. The observed widening of the band gap with increasingPArcan be understood as being a consequence of the poorer crystallinity of films grown at higher pressures. Measurements of morphological and electrical properties of these films correlate well with this picture. Our main aim is to understand the effects ofPAron several physical properties of the films, and most importantly on its optical band gap.


2004 ◽  
Vol 24 (6) ◽  
pp. 1847-1851 ◽  
Author(s):  
Jae Hyun Kim ◽  
Hyojin Kim ◽  
Dojin Kim ◽  
YoungEon Ihm ◽  
Woong Kil Choo

2010 ◽  
Vol 46 (6) ◽  
pp. 2152-2155 ◽  
Author(s):  
Yan Wu ◽  
K. V. Rao ◽  
Wolfgang Voit ◽  
Takahiko Tamaki ◽  
O. D. Jayakumar ◽  
...  

2008 ◽  
Vol 37 (5) ◽  
pp. 831-834 ◽  
Author(s):  
Wang Zhuliang ◽  
Li Xiaoli ◽  
Jiang Fengxian ◽  
Tian Baoqiang ◽  
Lü Baohua ◽  
...  

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