Influence of oxygen flow rate on the structural, optical and electrical properties of ZnO films grown by DC magnetron sputtering

2016 ◽  
Vol 122 (4) ◽  
Author(s):  
Chaya Ravi Gobbiner ◽  
Muhammed Ali Avanee Veedu ◽  
Dhananjaya Kekuda
Keyword(s):  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Zno Films ◽  
Optical And Electrical Properties ◽  
Dc Magnetron Sputtering

scholarly journals Influence of oxygen flow rate on photocatalytic TiO2 films deposited by rf magnetron sputtering

2011 ◽  
Vol 23 (2) ◽  
pp. 589-594 ◽  
Author(s):  
A. H. Chiou ◽  
C. G. Kuo ◽  
C. H. Huang ◽  
W. F. Wu ◽  
C. P. Chou ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Flow Rate ◽  
Rf Magnetron Sputtering ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Tio2 Films ◽  
Photocatalytic Tio2

Influence of Oxygen Flow Rate on the Properties of ITO Films Prepared by Low-Frequency (60 Hz) Magnetron Sputtering

2006 ◽  
Vol 459 (1) ◽  
pp. 221/[501]-229/[509]
Author(s):  
Sung Ho Lee ◽  
Do Kyung Lee ◽  
Seung Han Seo ◽  
Ji Hoon Oh ◽  
Sang Kooun Jung ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Flow Rate ◽  
Low Frequency ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Ito Films

scholarly journals Optical and Electrical Properties of TiO2/Co/TiO2 Multilayer Films Grown by DC Magnetron Sputtering

2018 ◽  
Vol 2018 ◽  
pp. 1-8 ◽  
Author(s):  
Marcos G. Valluzzi ◽  
Lucas G. Valluzzi ◽  
Marcos Meyer ◽  
María A. Hernández-Fenollosa ◽  
Laura C. Damonte
Keyword(s):  
Electrical Properties ◽  
Optical Absorption ◽  
Magnetron Sputtering ◽  
Absorption Edge ◽  
Multilayer Films ◽  
Optical And Electrical Properties ◽  
Optical Absorption Edge ◽  
Interlayer Thickness ◽  
Dc Magnetron Sputtering ◽  
Force Microscopy

Transparent oxide multilayer films of TiO2/Co/TiO2 were grown on glass substrate by DC magnetron sputtering technique. The optical and electrical properties of these films were analyzed with the aim of substituting ITO substrate in optoelectronic devices. The samples were characterized by UV-visible spectroscopy, atomic force microscopy (AFM), and Kelvin probe force microscopy (KPFM). The effect of Co interlayer thickness (4, 8, and 12 nm) on the transmittance spectra yielded an optical absorption edge shift. The work function of these films was determined by KPFM technique allowing us to predict the Fermi level shift by extending the model for pure materials to our multilayer system. The Fermi level and optical absorption edge seem to be correlated and shifted toward lower energies when Co interlayer thickness is increased.

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