Electromigration behavior of silver thin film fabricated by electron-beam physical vapor deposition

Author(s):  
Zhi Jin ◽  
Yu-An Shen ◽  
Fupeng Huo ◽  
Y. C. Chan ◽  
Hiroshi Nishikawa
2011 ◽  
Vol 25 (19) ◽  
pp. 2567-2574 ◽  
Author(s):  
M. YEGANEH ◽  
M. SAREMI

Electron beam physical vapor deposition (EBPVD) is being used in coating components for many applications such as for producing nanostructures and integrated circuits (ICs) coating in electronic industry. In this work, copper was deposited on the SiO 2/p-type Si (100). Thin film characteristics are investigated by scanning electron microscopy and X-ray diffraction (XRD). Then oxidation behavior of deposits was evaluated by Dektak Surface Profiler and weight gain method at 200 and 300°C. Results showed that thin film copper deposited by EBPVD has better oxidation characteristics in comparison with copper foil.


2007 ◽  
Vol 253 (9) ◽  
pp. 4361-4366 ◽  
Author(s):  
Jian Yi ◽  
XiaoDong He ◽  
Yue Sun ◽  
Yao Li

2012 ◽  
Vol 1 (1) ◽  
pp. 46 ◽  
Author(s):  
Amir Mahyar Khorasani ◽  
Mohammad Reza Solymany yazdi ◽  
Mehdi Faraji ◽  
Alex Kootsookos

Thin-film coating plays a prominent role on the manufacture of many industrial devices. Coating can increase material performance due to the deposition process. Having adequate and precise model that can predict the hardness of PVD and CVD processes is so helpful for manufacturers and engineers to choose suitable parameters in order to obtain the best hardness and decreasing cost and time of industrial productions. This paper proposes the estimation of hardness of titanium thin-film layers as protective industrial tools by using multi-layer perceptron (MLP) neural network. Based on the experimental data that was obtained during the process of chemical vapor deposition (CVD) and physical vapor deposition (PVD), the modeling of the coating variables for predicting hardness of titanium thin-film layers, is performed. Then, the obtained results are experimentally verified and very accurate outcomes had been attained.


2006 ◽  
Vol 522-523 ◽  
pp. 267-276 ◽  
Author(s):  
Kunihiko Wada ◽  
Yutaka Ishiwata ◽  
Norio Yamaguchi ◽  
Hideaki Matsubara

Several kinds of thermal barrier coatings (TBCs) deposited by electron beam physical vapor deposition (EB-PVD) were produced as a function of electron beam power in order to evaluate their strain tolerance. The deposition temperatures were changed from 1210 K to 1303 K depending on EB power. In order to evaluate strain tolerances of the EB-PVD/TBCs, a uniaxial compressive spallation test was newly proposed in this study. In addition, the microstructures of the layers were observed with SEM and Young’s moduli were measured by a nanoindentation test. The strain tolerance in as-deposited samples decreased with an increase in deposition temperature. In the sample deposited at 1210 and 1268 K, high-temperature aging treatment at 1273 K for 10 h remarkably promoted the reduction of the strain tolerance. The growth of thermally grown oxide (TGO) layer generated at the interface between topcoat and bondcoat layers was the principal reason for this strain tolerance reduction. We observed TGO-layer growth even in the as-deposited sample. Although the thickness of the initial TGO layer in the sample deposited at high temperature was thicker, the growth rate during aging treatment was smaller than those of the other specimens. This result suggests that we can improve the oxidation resistance of TBC systems by controlling the processing parameters in the EB-PVD process.


2016 ◽  
Vol 70 (11) ◽  
Author(s):  
Andreas Eder ◽  
Gerwin H.S. Schmid ◽  
Harald Mahr ◽  
Christoph Eisenmenger-Sittner

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