DEPOSITION OF THIN FILM COPPER NANOSTRUCTURES BY ELECTRON BEAM PHYSICAL VAPOR DEPOSITION TECHNIQUE ON SiO2/p-TYPE Si(100) AND STUDY OF ITS OXIDATION BEHAVIOR

2011 ◽  
Vol 25 (19) ◽  
pp. 2567-2574 ◽  
Author(s):  
M. YEGANEH ◽  
M. SAREMI
Keyword(s):  
Thin Film ◽  
Electron Beam ◽  
Integrated Circuits ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Oxidation Behavior ◽  
X Ray Diffraction ◽  
Vapor Deposition Technique ◽  
Physical Vapor Deposition Technique ◽  
P Type

Electron beam physical vapor deposition (EBPVD) is being used in coating components for many applications such as for producing nanostructures and integrated circuits (ICs) coating in electronic industry. In this work, copper was deposited on the SiO 2/p-type Si (100). Thin film characteristics are investigated by scanning electron microscopy and X-ray diffraction (XRD). Then oxidation behavior of deposits was evaluated by Dektak Surface Profiler and weight gain method at 200 and 300°C. Results showed that thin film copper deposited by EBPVD has better oxidation characteristics in comparison with copper foil.

Tensile Behavior and Fractography of Ti-TiAl Multi-Layered Foil Prepared by Electron Beam Physical Vapor Deposition Technology

2011 ◽  
Vol 55-57 ◽  
pp. 183-187 ◽  
Author(s):  
Zhao Hui Hu ◽  
Yi Li ◽  
Li Ma ◽  
Hong Jun Liu
Keyword(s):  
Electron Beam ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Tensile Behavior ◽  
Breaking Strain ◽  
Delayed Fracture ◽  
Plastic Deformation Process ◽  
Wide Range ◽  
Vapor Deposition Technique ◽  
Physical Vapor Deposition Technique

Ti-TiAl multi-layered materials have been prepared by electron beam physical vapor deposition technique. The tensile behavior of samples at room temperature and high temperature was tested, and then the deformation mechanism at different temperature was analyzed according to the fracture surface. The results show that the tensile curves hot-pressed samples have a broad step during the plastic deformation process, and the breaking strain of the sample has been increased for a wide-range. The presence of Ti layers have led to the cracks stagger along the inter-laminar interface or the layer due to which micro laminate expresses a good characteristic of delayed fracture. With the increase of temperature, the bulk modulus and yield strength of multi-layered Ti-TiAl have been increased abnormally due to the anomalous yield strengthening behavior of TiAl intermetallic.

Performance of Erbium-doped TiO2 thin film grown by physical vapor deposition technique

2017 ◽  
Vol 123 (9) ◽  
Author(s):  
Rini Lahiri ◽  
Anupam Ghosh ◽  
Shyam Murli Manohar Dhar Dwivedi ◽  
Shubhro Chakrabartty ◽  
P. Chinnamuthu ◽  
...  
Keyword(s):  
Thin Film ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Tio2 Thin Film ◽  
Deposition Technique ◽  
Doped Tio2 ◽  
Vapor Deposition Technique ◽  
Erbium Doped ◽  
Physical Vapor Deposition Technique

The Characteristics of an Antibacterial TiAgN Thin Film Coated by Physical Vapor Deposition Technique

2015 ◽  
Vol 15 (8) ◽  
pp. 6020-6023 ◽  
Author(s):  
Byeong-Mo Kang ◽  
Woon-Jo Jeong ◽  
Gye-Choon Park ◽  
Dong-Joo Yoon ◽  
Ho-Geun Ahn ◽  
...  
Keyword(s):  
Thin Film ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Deposition Technique ◽  
Vapor Deposition Technique ◽  
Physical Vapor Deposition Technique

scholarly journals Physical Vapor Deposited Silver (AG) Based Metal-Dielectric Nanocomposites for Advanced Thin-Film and Coating Applications

2021 ◽  
Author(s):  
Mohammad Nur-E-Alam ◽  
Mohammad Khairul Basher ◽  
Mikhail Vasiliev ◽  
Narottam Das
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Future Application ◽  
Thin Film Coatings ◽  
Environment And Health ◽  
Vapor Deposition Technique ◽  
Nanocomposite Thin Films ◽  
Physical Vapor Deposition Technique

Metallic thin-film materials and nanoparticles (mainly Silver (Ag)-based) are recently being used in many nano-technological applications including sensors, reflective heat-mirror coatings, and antibacterial coatings as well. The physical vapor deposition technique attracts significant attention for Ag-based nanocomposites with tailoring the structural and optical properties of metallic thin films thus allowing further improvements and application possibilities in various existing fields namely electronics, catalysis, magnetics, optics in alongside the environment and health and new emergent fields in, particularly thin-film coatings. This study highlights the preparation, characterization, properties, and possible future application directions of several types of Silver (Ag)-based nanocomposite thin films prepared by using physical vapor deposition techniques.

scholarly journals Luminescence and Structure of ZnO Grown by Physical Vapor Deposition

2012 ◽  
Vol 2012 ◽  
pp. 1-5 ◽  
Author(s):  
R. García-Gutiérrez ◽  
M. Barboza-Flores ◽  
D. Berman-Mendoza ◽  
R. Rangel-Segura ◽  
O. E. Contreras-López
Keyword(s):  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Luminescent Properties ◽  
Growth Direction ◽  
X Ray Diffraction ◽  
Band Emission ◽  
Ultra High Purity ◽  
Vapor Deposition Technique ◽  
Physical Vapor Deposition Technique ◽  
Xrd Patterns

Nanostructured ZnO was deposited on different substrates (Si, SiO2, and Au/SiO2) by an enhanced physical vapor deposition technique that presents excellent luminescent properties. This technique consists in a horizontal quartz tube reactor that uses ultra-high purity Zn and UHP oxygen as precursors. The morphology and structure of ZnO grown in this work were studied by electron microscopy and X-ray diffraction. The XRD patterns revealed the highly crystalline phase of wurtzite polycrystalline structure, with a preferred (1011) growth direction. Room temperature cathodoluminescence studies revealed two features in the luminescence properties of the ZnO obtained by this technique, first a high-intensity narrow peak centered at 390 nm (~3.2 eV) corresponding to a near band-to-band emission, and secondly, a broad peak centered around 517 nm (2.4 eV), the typical green-yellow luminescence, related to an unintentionally doped ZnO.

scholarly journals Physical Vapor-Deposited Silver (Ag)-Based Metal-Dielectric Nanocomposites for Thin-Film and Coating Applications

2021 ◽  
Vol 11 (15) ◽  
pp. 6746
Author(s):  
Mohammad Nur-E-Alam ◽  
Mohammad Khairul Basher ◽  
Mikhail Vasiliev ◽  
Narottam Das
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Composite Layer ◽  
Future Application ◽  
Thin Film Coatings ◽  
Environment And Health ◽  
Vapor Deposition Technique ◽  
Physical Vapor Deposition Technique

Metallic thin-film materials and nanoparticles (mainly silver (Ag)-based) are recently being used in many nano-technological applications, including sensors, reflective heat-mirror coatings, and antibacterial coatings. The physical vapor deposition technique has attracted significant attention for Ag-based nanocomposites with tailoring of the structural and optical properties of metallic thin films, thus allowing for further improvements and application possibilities in various existing fields, namely electronics, catalysis, magnetics, and optics, alongside the environment and health and new emergent fields, particularly thin-film coatings. This study highlights the preparation, characterization, properties, and possible future application directions of several types of silver (Ag)-based nanocomposite thin films prepared by using physical vapor deposition techniques. The high-temperature (above 300 °C) heat-treated composite layer shows significant spectral shifts; however, distinguishingly notable sizes of nanoparticles are not observed, which indicates that this newly developed composite material can be useful for various coating applications.

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