Influence of sputtering power on structural, optical and electrical properties of CdTe thin films prepared by DC magnetron sputtering

2018 ◽  
Vol 29 (17) ◽  
pp. 14635-14642 ◽  
Author(s):  
Peng Gu ◽  
Xinghua Zhu ◽  
Jitao Li ◽  
Haihua Wu ◽  
Dingyu Yang
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Optical And Electrical Properties ◽  
Dc Magnetron Sputtering ◽  
Sputtering Power ◽  
Cdte Thin Films

The Effects of O2:N2 Gas Ratios on Structural, Optical, Electrical Properties of TiOxNy Thin Film Deposited by Reactive DC Magnetron Sputtering

2015 ◽  
Vol 659 ◽  
pp. 540-544
Author(s):  
Tanakorn Khumtong ◽  
Rachsak Sakdanuphab
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Amorphous Structure ◽  
Phase Changes ◽  
Optical And Electrical Properties ◽  
Dc Magnetron Sputtering ◽  
Ar Gas ◽  
And Shifts ◽  
Gas Ratio

In this work, titaniumoxynitride (TiOxNy) thin films were deposited on glass slide substrates by using reactive dc magnetron sputtering technique. The reactive gas ratios between O2and N2were studied in the range of 15-30% with a constant of Ar gas at 110 sccm and a time of 120 minutes. Microstructure, optical, and electrical properties of TiOxNythin films were analysis by using SEM, AFM, GIXRD, UV-VIS spectrophotometer, and 4-point probe measurements. We found that the thickness of the films decreases from 1.0 to 0.8 μm by increasing of O2gas ratios. The TiOxNythin films have smooth surface related to small nanograin size. The roughness of the films slightly decreases when O2gas ratios increase. From optical transmission spectra, we observed that the transparent of the films increases with different O2gas ratio and shifts the band gap from 2.67 to 3.32 eV. The resistivity of the films obviously increases from 3.04 x 10-3Ω-cm to 5.45 Ω-cm depending on O2gas ratio. These results indicate the phase changes of the TiOxNyfilms from metallic to oxide phases. The XRD spectra show poor crystalline TiN (220) and TiO2(021) at 15% of O2ratio and then the films become amorphous structure by increasing the O2gases. The O2:N2gas ratios also affects to the different concentration of oxygen and nitrogen into the TiOxNythin films that lead to the various structural, optical and electrical properties.

Preparation and Conductive Properties of Ag Thin Film by DC Magnetron Sputtering Method

2012 ◽  
Vol 217-219 ◽  
pp. 1068-1072
Author(s):  
Jian Guang Lin ◽  
Wei Xiang Weng ◽  
Wei Hui Huang ◽  
Hai Fang Zhou
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Float Glass ◽  
Dc Magnetron Sputtering ◽  
Optimum Parameters ◽  
Sputtering Power ◽  
Sputtering Pressure

Ag thin films were prepared on the float-glass substrate by DC magnetron sputtering method. The relationship of surface morphology/electrical properties with technical conditions was investigated. The experimental results showed that sputtering power, sputtering pressure and substrate temperature had effects on the morphology and electrical properties of Ag thin films. The optimum parameters were obtained with sputtering power of 100 W，sputtering pressure of 0.4 Pa and substrate temperature of 130 °C. Under the optimum parameters, the deposited Ag thin film was smooth and its resistivity was as low as 1.96×10-8 Ω•m.

scholarly journals Structural, Optical and Electrical Properties of Al+MoO3 and Au+MoO3 Thin Films Prepared by Magnetron Codeposition

Materials ◽  
2021 ◽  
Vol 14 (4) ◽  
pp. 766
Author(s):  
Tihomir Car ◽  
Ivan Jakovac ◽  
Ivana Šarić ◽  
Sigrid Bernstorff ◽  
Maja Micetic
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Au Nanoparticle ◽  
Content Increase ◽  
Optical And Electrical Properties ◽  
Volume Percentage ◽  
Sputtering Deposition ◽  
Nanoparticle Formation ◽  
Al Content ◽  
Sputtering Power

Structural, optical and electrical properties of Al+MoO3 and Au+MoO3 thin films prepared by simultaneous magnetron sputtering deposition were investigated. The influence of MoO3 sputtering power on the Al and Au nanoparticle formation and spatial distribution was explored. We demonstrated the formation of spatially arranged Au nanoparticles in the MoO3 matrix, while Al incorporates in the MoO3 matrix without nanoparticle formation. The dependence of the Au nanoparticle size and arrangement on the MoO3 sputtering power was established. The Al-based films show a decrease of overall absorption with an Al content increase, while the Au-based films have the opposite trend. The transport properties of the investigated films also are completely different. The resistivity of the Al-based films increases with the Al content, while it decreases with the Au content increase. The reason is a different transport mechanism that occurs in the films due to their different structural properties. The choice of the incorporated material (Al or Au) and its volume percentage in the MoO3 matrix enables the design of materials with desirable optical and electrical characteristics for a variety of applications.

Sign in / Sign up

Export Citation Format

Share Document