Monitoring Hydrogen Plasma Reduction of Oxides by Na D Lines

2016 ◽  
Vol 36 (4) ◽  
pp. 1125-1139 ◽  
Author(s):  
Sarita Das ◽  
Debi Prasad Das ◽  
Priyanka Rajput ◽  
Joydeep Ghosh ◽  
Bhagyadhar Bhoi ◽  
...  
Keyword(s):  
Hydrogen Plasma ◽  
Reduction Of Oxides ◽  
Plasma Reduction

Sustainable steel through hydrogen plasma reduction of iron ore: process, kinetics, microstructure, chemistry

2021 ◽  
pp. 116971
Author(s):  
I.R.Souza Filho ◽  
Y. Ma ◽  
M. Kulse ◽  
D. Ponge ◽  
B. Gault ◽  
...  
Keyword(s):  
Iron Ore ◽  
Hydrogen Plasma ◽  
Process Kinetics ◽  
Reduction Of Iron ◽  
Plasma Reduction

Ultra-small metal nanoparticles supported on carbon nanotubes through surface chelation and hydrogen plasma reduction for methanol electro-oxidation

2019 ◽  
Vol 7 (42) ◽  
pp. 24502-24514
Author(s):  
Francisco Morales-Lara ◽  
Víctor K. Abdelkader-Fernández ◽  
Manuel Melguizo ◽  
Antonio Turco ◽  
Elisabetta Mazzotta ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Metal Nanoparticles ◽  
Hydrogen Plasma ◽  
Pt Nanoparticles ◽  
New Method ◽  
Multi Walled Carbon Nanotubes ◽  
Electro Oxidation ◽  
Walled Carbon Nanotubes ◽  
Plasma Reduction

This paper reports a new method to obtain ultra-small Pd and Pt nanoparticles (0.5–1 nm) supported on multi-walled carbon nanotubes (MWCNTs).

Observation of Reduced Oxidation Rates for Plasmaassisted CVD Copper Films

1993 ◽  
Vol 309 ◽  
Author(s):  
P. J. Ding ◽  
B. Zheng ◽  
E. T. Eisenbraun ◽  
W. A. Lanford ◽  
A. E. Kaloyeros ◽  
...  
Keyword(s):  
Rutherford Backscattering Spectrometry ◽  
Hydrogen Plasma ◽  
Chemical Vapor ◽  
Oxide Growth ◽  
Copper Films ◽  
Experimental Conditions ◽  
Oxidation Rates ◽  
Chemical Vapor Deposited ◽  
Kinetics Of ◽  
Plasma Reduction

AbstractOxidation kinetics of plasma-assisted chemical vapor deposited (PA-CVD) copper films were investigated using Rutherford backscattering spectrometry (RBS). The PA-CVD copper films were deposited using hydrogen plasma reduction of bis(hexafluoroacetylacetonato) copper(II), Cu(hfa)2, precursor. Under identical experimental conditions, PA-CVD copper films oxidize more slowly than sputtered copper films. This decrease in oxidationis manifested both as a time delay at the beginning of the oxidation of the PA-CVD copper films and as a decrease in the rate of oxide growth at oxidation temperatures of 200ºC and below. The possivation appears to be caused by the hydrogen plasma present during depostion.

XAS study of Ni2P/MCM-41 prepared by hydrogen plasma reduction

2013 ◽  
Vol 211 ◽  
pp. 126-130 ◽  
Author(s):  
Zhichao Sun ◽  
Xiang Li ◽  
Anjie Wang ◽  
Yao Wang ◽  
Yongying Chen ◽  
...  
Keyword(s):  
Hydrogen Plasma ◽  
Plasma Reduction ◽  
Mcm 41

Hydrogen plasma reduction induced oxygen vacancies in cubic In2O3 particles with enhanced photocatalytic performance

2018 ◽  
Vol 44 (18) ◽  
pp. 22235-22240 ◽  
Author(s):  
Chenyang Shi ◽  
Jinhua Liu ◽  
Weidong Li ◽  
Xia Jiang ◽  
Huayuan Yang ◽  
...  
Keyword(s):  
Oxygen Vacancies ◽  
Photocatalytic Performance ◽  
Hydrogen Plasma ◽  
Plasma Reduction

Bloodcompatibility Improvement of Titanium Oxide Film Modified by Hydrogen Plasma Reduction

2007 ◽  
Vol 330-332 ◽  
pp. 557-560 ◽  
Author(s):  
Y. Xu ◽  
Nan Huang ◽  
Hong Sun
Keyword(s):  
Oxide Film ◽  
Titanium Oxide ◽  
Photoelectron Spectroscopy ◽  
Platelet Adhesion ◽  
Hydrogen Plasma ◽  
Titanium Oxide Film ◽  
Rutile Structure ◽  
Xps Spectra ◽  
X Ray ◽  
Plasma Reduction

In this work, nonstoicheometric titanium oxide film on silicon matrix was prepared by unbalanced reactive pulsed magnetron sputtering /hydrogen plasma reduction method. The film chemical composition was analyzed by X-ray diffraction and X-ray photoelectron spectroscopy (XPS). The XRD patterns of the prepared films showed that titanium oxide films possess the single phase rutile structure . the XPS spectra of the film displayed that the valence state of Ti is Ti4+, Ti3+ and Ti2+ respectively and the films were nonstoichiomeric Ti-O film. The evidence showed that isolated oxygen exist in films. Ti/O ratio of Ti-O film from the XPS data vary with depth under different reduction temperature and time. And it corresponded with platelet adhesion tests of Ti-O film in vitro. Antithrombotic property of reduced titanium oxide thin films was examined by platelet adhesion tests. The results showed that the Ti-O films with lower non-stoicheometrical extent posses the better anticoagulation property than stoichiomeric TiO2 film and the Ti-O films with higher non-stoicheometrical extent. Hence hydrogen introducing is an effective way to improve the bloodcompatibility of titanium oxide film.

Electrochemical detection of methanol by platinum/carbon nanotubes nanocomposites synthesised via hydrogen plasma reduction process

2013 ◽  
Vol 8 (12) ◽  
pp. 890-894 ◽  
Author(s):  
Jielin Xu ◽  
Shenggao Wang ◽  
Zurong Du ◽  
Jinlong Zhu ◽  
Yi Liu ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Electrochemical Detection ◽  
Hydrogen Plasma ◽  
Reduction Process ◽  
Plasma Reduction
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