Influence of Germanium Source Dual Halo Dual Dielectric Triple Material Surrounding Gate Tunnel FET for Improved Analog/RF Performance

Silicon ◽  
2020 ◽  
Vol 12 (12) ◽  
pp. 2869-2877 ◽  
Author(s):  
M. Venkatesh ◽  
M. Suguna ◽  
N. B. Balamurugan
2021 ◽  
Author(s):  
Ritam Dutta ◽  
Nitai Paitya ◽  
Manisha Rahaman ◽  
Ankita Guha ◽  
Priya Kumari
Keyword(s):  

2012 ◽  
Vol 11 (2) ◽  
pp. 182-195 ◽  
Author(s):  
Angsuman Sarkar ◽  
Swapnadip De ◽  
Anup Dey ◽  
Chandan Kumar Sarkar

2016 ◽  
Vol 91 ◽  
pp. 319-330 ◽  
Author(s):  
Sudhansu Mohan Biswal ◽  
Biswajit Baral ◽  
Debashis De ◽  
Angsuman Sarkar

Author(s):  
Sidhartha Dash ◽  
Guru Prasad Mishra

Introduction: Here, we have presented an n-channel cylindrical gate tunnel FET with drain underlap engineering (CGT-DU) and the simulation process is carried out using 3-D device simulator from Synopsys. Methods: The analog and radio frequency (RF) performance of the device has been studied extensively in terms of electric field, energy band analysis, drain current, gain bandwidth product, unity gain cut‐off frequency, transconductance frequency product, and maximum oscillation frequency for different values of drain underlap length. Results: The increase in underlap length in CGT paves way for substantial reduction in ambipolar current without degrading the ON-state current. The proposed device exhibits lower lateral electric field, larger tunneling length and lower gate to drain capacitance at the drain end with higher underlap length. Conclusion: CGT-DU exhibits superior ambipolar and RF performance without degrading ON-state current and threshold voltage.


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