Silicon crystal growth in a cusp magnetic field

1989 ◽  
Vol 96 (4) ◽  
pp. 747-755 ◽  
Author(s):  
Hiroshi Hirata ◽  
Keigo Hoshikawa
2010 ◽  
Vol 312 (21) ◽  
pp. 3225-3234 ◽  
Author(s):  
A. Krauze ◽  
N. Jēkabsons ◽  
A. Muižnieks ◽  
A. Sabanskis ◽  
U. Lācis

2000 ◽  
Author(s):  
Tetsuo Munakata ◽  
Satoshi Someya ◽  
Ichiro Tanasawa

Abstract The impurity concentration distribution in a silicon crystal during the floating zone (FZ) growth process under radio-frequency (RF) heating and the effect of an externally applied magnetic field on the impurity distribution in the crystal have been investigated numerically. The main purpose of the study is to clarify the characteristics of the impurity distribution in the silicon crystal under the RF-FZ crystal growth process, and the effect of an externally applied magnetic field on such an impurity distribution. The numerically obtained characteristics on impurity distribution in the crystal are as follows. In the case of excluding the external magnetic field, impurity concentration in the crystal varies due to the fluctuation of the melt flow. If we apply an external magnetic field, such impurity variation in the crystal disappears due to the stabilizing effect of the external magnetic field. Further, the crystal growth rate is decreased, the impurity concentration in the crystal is also decreased. The impurity segregation coefficient does not affect the impurity distribution in the crystal.


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