Growth of ZnSe thin films on ITO/glass substrates by low pressure metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(92)90280-v ◽

1992 ◽

Vol 125 (3-4) ◽

pp. 420-424 ◽

Author(s):

C.T. Hsu ◽

Y.J. Lin ◽

Y.K. Su ◽

M. Yokoyama

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Glass Substrates ◽

Ito Glass ◽

Znse Thin Films ◽

Metalorganic Chemical

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Metalorganic chemical vapor deposition of ZnSe thin films on ITO/ glass substrates

Applied Surface Science ◽

10.1016/0169-4332(93)90764-3 ◽

1993 ◽

Vol 65-66 ◽

pp. 831-834 ◽

Author(s):

C.T. Hsu ◽

Y.K. Su ◽

T.S. Wu ◽

M. Yokoyama ◽

M. Takahashi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Glass Substrates ◽

Ito Glass ◽

Znse Thin Films ◽

Metalorganic Chemical

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Low-pressure Metalorganic Chemical Vapor Deposition and Characterization of YBa2Cu3O7−x Thin Films

Superconductivity and Applications ◽

10.1007/978-1-4684-7565-4_11 ◽

1990 ◽

pp. 127-138

Author(s):

P. Zawadzki ◽

G. S. Tompa ◽

P. Norris ◽

D. W. Noh ◽

B. Gallois ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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Low-pressure metalorganic chemical vapor deposition of high-quality AlN and GaN thin films on sapphire and silicon substrates

10.1117/12.206881 ◽

1995 ◽

Author(s):

Patrick Kung ◽

Xiaolong Zhang ◽

Erwan Bigan ◽

Manijeh Razeghi ◽

Adam W. Saxler

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Substrates ◽

High Quality ◽

Metalorganic Chemical

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ZnS Thin Films Prepared by Low-Pressure Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.4723 ◽

1994 ◽

Vol 33 (Part 1, No. 8) ◽

pp. 4723-4726 ◽

Author(s):

Jiin Wen Li ◽

Yan Kuin Su ◽

Meiso Yokoyama

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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Preparation of Zinc Titanate Thin Films by Low-Pressure Metalorganic Chemical Vapor Deposition

Journal of the American Ceramic Society ◽

10.1111/j.1151-2916.1995.tb09075.x ◽

1995 ◽

Vol 78 (11) ◽

pp. 2993-3001 ◽

Author(s):

Zhong-Xin Chen ◽

Joost Eyden ◽

Wouter Koot ◽

Rob Berg ◽

Jan van Mechelen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Zinc Titanate ◽

Metalorganic Chemical

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Preparation of ZnSe Thin Films by Metalorganic Chemical Vapor Deposition Using NF3

Journal of the Japan Institute of Metals and Materials ◽

10.2320/jinstmet1952.60.10_988 ◽

1996 ◽

Vol 60 (10) ◽

pp. 988-992 ◽

Author(s):

Tetsuya Ishikawa ◽

Mitsuharu Yamabe ◽

Yoshinori Hara ◽

Yasutoshi Noda

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Znse Thin Films ◽

Metalorganic Chemical

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Growth of N-doped ZnSe thin films by radical-assisted metalorganic chemical vapor deposition.

Journal of Advanced Science ◽

10.2978/jsas.9.55 ◽

1997 ◽

Vol 9 (1/2) ◽

pp. 55-59 ◽

Author(s):

Yoshinori HARA ◽

Yasutoshi NODA

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Znse Thin Films ◽

Metalorganic Chemical

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Structural and electrical properties of Al2O3 thin films on p-Si grown by low-pressure metalorganic chemical vapor deposition

Applied Surface Science ◽

10.1016/0169-4332(93)90768-7 ◽

1993 ◽

Vol 65-66 ◽

pp. 854-857 ◽

Author(s):

T.W. Kim ◽

S.S. Yom ◽

W.N. Kang ◽

Y.S. Yoon ◽

Chayeon Kim ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Structural And Electrical Properties ◽

Metalorganic Chemical

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Growth of ZnSe thin films by metalorganic chemical vapor deposition using nitrogen trifluoride

Applied Surface Science ◽

10.1016/s0169-4332(96)00811-2 ◽

1997 ◽

Vol 113-114 ◽

pp. 28-32 ◽

Author(s):

Yasutoshi Noda ◽

Tetsuya Ishikawa ◽

Mitsuharu Yamabe ◽

Yoshinori Hara

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Nitrogen Trifluoride ◽

Znse Thin Films ◽

Metalorganic Chemical

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Electric Field Effect on ZnSe Thin Films Prepared by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.161 ◽

1994 ◽

Vol 33 (Part 1, No.1A) ◽

pp. 161-163 ◽

Author(s):

Chin Tsar Hsu ◽

Yan Kuin Su ◽

Tien Shou Wu ◽

Meiso Yokoyama

Keyword(s):

Chemical Vapor Deposition ◽

Electric Field ◽

Vapor Deposition ◽

Field Effect ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Electric Field Effect ◽

Znse Thin Films ◽

Metalorganic Chemical

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