The effect of concentration on the cathodic electrodeposition process

1988 ◽  
Vol 16 (3) ◽  
pp. 255-263 ◽  
Author(s):  
V.B. Mišković-Stanković ◽  
M.D. Maksimović
1986 ◽  
Vol 27 (1) ◽  
pp. 89-94 ◽  
Author(s):  
M.D. Maksimović ◽  
V.B. Mišković-Stanković ◽  
N.V. Krstajić

2017 ◽  
Vol 6 (2) ◽  
pp. 107
Author(s):  
A. Kassim ◽  
Z. Zainal ◽  
N. Saravanan ◽  
R. Vikneshwari ◽  
S. Malathi

Cathodic electrodeposition in the presence of sodium dodecyl-sulphate in aqueous solution was used to prepare CuSe thin film deposited on titanium substrates. The effect of deposition potential, concentration<br />and deposition time were studied to determine the optimum condition for the electrodeposition process. The films were characterized by X-ray diffractrometry. Scanning electron microscopy was used to study<br />the morphology of the deposits. The photoresponse of the films prepared was analysed using linear sweep voltammetry in the presence of sodium thiosulphate.


2008 ◽  
Vol 15 (04) ◽  
pp. 419-426 ◽  
Author(s):  
N. J. YAO ◽  
S. M. HUANG ◽  
J. B. CHU ◽  
H. B. ZHU ◽  
Z. SUN ◽  
...  

Copper indium diselenide ( CuInSe 2) thin films were grown on indium–tin oxide (ITO)/soda-lime glass using a one-step cathodic electrodeposition process at potentials lower than -0.6 V vs SCE, and in the presence of a large excess of In 3+. The source solution contained CuCl 2, InCl 3, and H 2 SeO 3 complexed by citric acid. The concentration of InCl 3 in the electrochemical bath affected the structure, composition, stoichiometric ratio, and morphological properties of electrodeposited films. CuInSe 2 films with a chalcopyrite structure and quite good stoichiometry were directly electrodeposited from a solution of 20 mM InCl 3, 5 mM CuCl 2, and 8 mM H 2 SeO 3. Annealing of these CuInSe 2 films in the temperature range from 300°C to 500°C improves their crystallinity and increases their grain size. Good chalcopyrite CuInSe 2 films with a (112) preferential orientation suitable for the production of efficient solar cells are obtained after annealing at 500°C. The formation mechanism of the ternary CuInSe 2 compound during the electrodeposition process was discussed.


2002 ◽  
Vol 67 (5) ◽  
pp. 305-324 ◽  
Author(s):  
Vesna Miskovic-Stankovic

The model of organic film growth on a cathode during electrodeposition process proposes the current density-time and film thickness-time relationships and enables the evaluation of the rate contents for the electrochemical reaction of OH? ion evolution and for the chemical reaction of organic film deposition. The dependencies of film thickness and rate constants on the applied voltage, bath temperature and resin concentration in the electrodeposition bath have also been obtained. The deposition parameters have a great effect on the cathodic electrodeposition process and on the protective properties of the obtained electrodeposited coatings. From the time dependencies of the pore resistance, coating capacitance and relative permittivity, obtained from impedance measurements, the effect of applied voltage, bath temperature and resin concentration on the protective properties of electrodeposited coatings has been shown. Using electrochemical impedance spectroscopy, thermogravimetric analysis gravimetric liquid sorption experiments, differential scanning calorimetry and optical miscroscopy, the corrosion stability of epoxy coatings was investigated. A mechanism for the penetration of electrolyte through an organic coating has been suggested and the shape and dimensions of the conducting macropores have been determined. It was shown that conduction through a coating depends only on the conduction through the macropores although the quantity of electrolyte in the micropores of the polymer net is about one order of magnitude greater than that inside the conducting macropores.


RSC Advances ◽  
2016 ◽  
Vol 6 (91) ◽  
pp. 88315-88320 ◽  
Author(s):  
X. Z. Deng ◽  
Y. W. Wang ◽  
J. P. Peng ◽  
K. J. Liu ◽  
N. X. Feng ◽  
...  

The nanocomposites Mg(OH)2/graphene (nano-MG) were controllably prepared by a facile cathodic electrodeposition.


1993 ◽  
Vol 233 (1-2) ◽  
pp. 91-95 ◽  
Author(s):  
C. Tian ◽  
G. Jin ◽  
F. Chao ◽  
M. Costa ◽  
J.P. Roger

2014 ◽  
Vol 240 ◽  
pp. 327-335 ◽  
Author(s):  
Lj.S. Živković ◽  
J.P. Popić ◽  
B.V. Jegdić ◽  
Z. Dohčević-Mitrović ◽  
J.B. Bajat ◽  
...  

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