Characterization of aluminum/LPCVD polysilicon Schottky barrier diodes

1987 ◽  
Vol 30 (3) ◽  
pp. 339-343
Author(s):  
Dao-Long Chen ◽  
David W. Greve ◽  
Alberto M. Guzman
2002 ◽  
Vol 742 ◽  
Author(s):  
T. Kimoto ◽  
K. Hashimoto ◽  
K. Fujihira ◽  
K. Danno ◽  
S. Nakamura ◽  
...  

ABSTRACTHomoepitaxial growth, impurity doping, and diode fabrication on 4H-SiC(11–20) and (03–38) have been investigated. Although the efficiency of nitrogen incorporation is higher on the non-standard faces than on (0001), a low background doping concentration of 2∼3×1014 cm-3 can be achieved. On these faces, boron and aluminum are less effectively incorporated, compared to the growth on off-axis (0001). 4H-SiC(11–20) epilayers are micropipe-free, as expected. More interestingly, almost perfect micropipe closing has been realized in 4H-SiC (03–38) epitaxial growth. Ni/4H-SiC(11–20) and (03–38) Schottky barrier diodes showed promising characteritics of 3.36 kV-24 mΩcm2 and 3.28 kV–22 mΩcm2, respectively. The breakdown voltage of 4H-SiC(03–38) Schottky barrier diodes was significantly improved from 1 kV to above 2.5 kV by micropipe closing.


Vacuum ◽  
2000 ◽  
Vol 57 (2) ◽  
pp. 219-228 ◽  
Author(s):  
B. Akkal ◽  
Z. Benamara ◽  
B. Gruzza ◽  
L. Bideux

2016 ◽  
Vol 3 (5) ◽  
pp. 1255-1261 ◽  
Author(s):  
M. Yıldırım ◽  
N. Tuğluoğlu ◽  
Ö.F. Yüksel ◽  
A. Erdoğan ◽  
M. Kuş

2020 ◽  
Vol 29 (4) ◽  
pp. 047305
Author(s):  
Wei-Fan Wang ◽  
Jian-Feng Wang ◽  
Yu-Min Zhang ◽  
Teng-Kun Li ◽  
Rui Xiong ◽  
...  

2018 ◽  
Vol 89 (11) ◽  
pp. 114903 ◽  
Author(s):  
Bikramjit Chatterjee ◽  
Asanka Jayawardena ◽  
Eric Heller ◽  
David W. Snyder ◽  
Sarit Dhar ◽  
...  

2013 ◽  
Vol 103 (19) ◽  
pp. 193106 ◽  
Author(s):  
Chanyoung Yim ◽  
Niall McEvoy ◽  
Georg S. Duesberg

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