Thin-film growth-mode analysis by low energy ion scattering

1996 ◽  
Vol 363 (1-3) ◽  
pp. 161-165 ◽  
Author(s):  
Yasunori Tanaka ◽  
Hideki Morishita ◽  
Jeong Tak Ryu ◽  
Itsuo Katayama ◽  
Kenjiro Oura
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Low Energy ◽  
Thin Film Growth ◽  
Growth Mode ◽  
Mode Analysis ◽  
Ion Scattering ◽  
Low Energy Ion Scattering

Thin film analysis by low-energy ion scattering by use of TRBS simulations

2015 ◽  
Vol 33 (1) ◽  
pp. 01A122 ◽  
Author(s):  
Philipp Brüner ◽  
Thomas Grehl ◽  
Hidde Brongersma ◽  
Blanka Detlefs ◽  
Emmanuel Nolot ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Energy ◽  
Film Analysis ◽  
Ion Scattering ◽  
Thin Film Analysis ◽  
Low Energy Ion Scattering

Surfactant-Mediated Epitaxial Growth of Metallic Thin Films

2010 ◽  
Vol 117 ◽  
pp. 55-61
Author(s):  
Masao Kamiko ◽  
Ryoichi Yamamoto
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Epitaxial Growth ◽  
Film Growth ◽  
Thin Film Growth ◽  
Growth Mode ◽  
Metallic Thin Films ◽  
Layer By Layer ◽  
Metallic Films ◽  
Heteroepitaxial Growth

The effects of several surfactants on the homoepitaxial and heteroepitaxial growth of metallic films and multilayers have been studied and compared. Our measurements clearly revealed that pre-deposition of a small amount of surfactant prior to the adatom deposition changed thin film growth mode and structure. The pre-deposited surfactant enhanced layer-by-layer (LBL) growth of the homoepitaxial and heteroepitaxial growth of metallic films. The surfactant also enhanced the epitaxial growth of metallic multilayer.

Hydrogen Adsorption Effects on Thin Film Growth Mode Studied by Ion Scattering

1991 ◽  
Vol 237 ◽  
Author(s):  
F. ShojiK ◽  
K. Sumitomo ◽  
T. Kinoshita ◽  
Y. Tanaka ◽  
K. Oura ◽  
...  
Keyword(s):  
Thin Films ◽  
Growth Process ◽  
Hydrogen Adsorption ◽  
Film Growth ◽  
Low Energy ◽  
Ion Scattering ◽  
Detection Analysis ◽  
Low Energy Ion Scattering ◽  
Flight Mode ◽  
Ion Scattering Spectroscopy

ABSTRACTThe effects of hydrogen adsorption on the growth process and structures of Ag thin films on Si(111)-7×7 surfaces has been studied. The growth process and film structures are investigated by low energy electron diffraction(LEED) and low energy ion scattering spectroscopy of time of flight mode(TOF-ICISS). The hydrogen adsorbed on the surface is investigated by low energy recoil detection analysis(TOF-ERDA). We have found that Ag thin films deposited onto hydrogen covered Si(111) surfaces grow with a mode definitely different from that on clean surfaces.

High-temperature goniometer for thin film growth and ion scattering studies

2001 ◽  
Vol 72 (3) ◽  
pp. 1755 ◽  
Author(s):  
M. Lippmaa ◽  
T. Furumochi ◽  
S. Ohashi ◽  
M. Kawasaki ◽  
H. Koinuma ◽  
...  
Keyword(s):  
Thin Film ◽  
High Temperature ◽  
Film Growth ◽  
Thin Film Growth ◽  
Ion Scattering

Thin Film Growth

1987 ◽  
Vol 103 ◽  
Author(s):  
R. W. Vook
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Thin Film Growth ◽  
Growth Mode ◽  
Growth Modes ◽  
Epitaxial Multilayers ◽  
Theoretical Results

ABSTRACTA review of the experimental and theoretical results describing thin film growth modes is presented. Thermodynamic criteria for determining which growth mode might be expected to occur in a particular case along with some kinetic considerations are given. The characteristics of each of the three principal growth modes, namely Frank and van der Merwe (layer), Stranski-Krastanov (layer plus island), and Volmer-Weber (island), are discussed. Lastly, the requirements favoring the growth of epitaxial multilayers are briefly considered.

GROWTH AND STRUCTURE OF hcp Ti FILMS ON Al(111) SURFACES

1999 ◽  
Vol 06 (05) ◽  
pp. 775-780 ◽  
Author(s):  
Y. W. KIM ◽  
G. A. WHITE ◽  
N. R. SHIVAPARAN ◽  
M. A. TETER ◽  
R. J. SMITH
Keyword(s):  
Photoelectron Spectroscopy ◽  
Film Growth ◽  
Three Dimensional ◽  
High Energy ◽  
Low Energy ◽  
Ion Scattering ◽  
Island Growth ◽  
X Ray ◽  
Low Energy Ion Scattering ◽  
Ti Films

The structure of thin Ti films grown on Al(111) surfaces at room temperature has been studied using high energy ion scattering/channeling (HEIS), X-ray photoelectron spectroscopy (XPS), low energy ion scattering (LEIS), low energy electron diffraction (LEED) and X-ray photoelectron diffraction (XPD). Our results show that Ti grows in the SK mode on the Al(111) surface. Ti atoms form a two-dimensional overlayer up to a deposition of about 2 ML Ti, followed by three-dimensional island growth with additional Ti deposition. The Ti islands cover the surface completely at about 12 ML of Ti deposition. XPD results show that the Ti overlayer has a well-ordered hcp Ti(0001) structure on the fcc Al(111) surface, in remarkable contrast to the fcc Ti film growth observed on Al(001) and Al(110) surfaces.

scholarly journals Focused Ion Beams. Thin Film Growth by Low Energy Focused Ion Beam.

Hyomen Kagaku ◽  
1995 ◽  
Vol 16 (12) ◽  
pp. 724-728
Author(s):  
Shinji NAGAMACHI ◽  
Masahiro UEDA ◽  
Junzo ISHIKAWA
Keyword(s):  
Thin Film ◽  
Focused Ion Beam ◽  
Film Growth ◽  
Ion Beam ◽  
Ion Beams ◽  
Low Energy ◽  
Thin Film Growth ◽  
Focused Ion Beams
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