The Effect of Thin-Film Growth Mode on XPS/UPS/AES Intensities,

1984 ◽  
Author(s):  
P. A. Bertrand
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Thin Film Growth ◽  
Growth Mode

Surfactant-Mediated Epitaxial Growth of Metallic Thin Films

2010 ◽  
Vol 117 ◽  
pp. 55-61
Author(s):  
Masao Kamiko ◽  
Ryoichi Yamamoto
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Epitaxial Growth ◽  
Film Growth ◽  
Thin Film Growth ◽  
Growth Mode ◽  
Metallic Thin Films ◽  
Layer By Layer ◽  
Metallic Films ◽  
Heteroepitaxial Growth

The effects of several surfactants on the homoepitaxial and heteroepitaxial growth of metallic films and multilayers have been studied and compared. Our measurements clearly revealed that pre-deposition of a small amount of surfactant prior to the adatom deposition changed thin film growth mode and structure. The pre-deposited surfactant enhanced layer-by-layer (LBL) growth of the homoepitaxial and heteroepitaxial growth of metallic films. The surfactant also enhanced the epitaxial growth of metallic multilayer.

Thin-film growth-mode analysis by low energy ion scattering

1996 ◽  
Vol 363 (1-3) ◽  
pp. 161-165 ◽  
Author(s):  
Yasunori Tanaka ◽  
Hideki Morishita ◽  
Jeong Tak Ryu ◽  
Itsuo Katayama ◽  
Kenjiro Oura
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Low Energy ◽  
Thin Film Growth ◽  
Growth Mode ◽  
Mode Analysis ◽  
Ion Scattering ◽  
Low Energy Ion Scattering

Thin Film Growth

1987 ◽  
Vol 103 ◽  
Author(s):  
R. W. Vook
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Thin Film Growth ◽  
Growth Mode ◽  
Growth Modes ◽  
Epitaxial Multilayers ◽  
Theoretical Results

ABSTRACTA review of the experimental and theoretical results describing thin film growth modes is presented. Thermodynamic criteria for determining which growth mode might be expected to occur in a particular case along with some kinetic considerations are given. The characteristics of each of the three principal growth modes, namely Frank and van der Merwe (layer), Stranski-Krastanov (layer plus island), and Volmer-Weber (island), are discussed. Lastly, the requirements favoring the growth of epitaxial multilayers are briefly considered.

Electron elastic scattering study of thin film growth mode: Rh on Al2O3

Vacuum ◽  
1998 ◽  
Vol 50 (1-2) ◽  
pp. 147-149 ◽  
Author(s):  
V Matolín ◽  
R Kapsa ◽  
V Nehasil ◽  
MM Thiam
Keyword(s):  
Thin Film ◽  
Elastic Scattering ◽  
Film Growth ◽  
Thin Film Growth ◽  
Growth Mode ◽  
Scattering Study

scholarly journals Thin film growth of heavy fermion chiral magnet YbNi3Al9

2021 ◽  
Vol 118 (10) ◽  
pp. 102402
Author(s):  
Hiroaki Shishido ◽  
Akira Okumura ◽  
Tatsuya Saimyoji ◽  
Shota Nakamura ◽  
Shigeo Ohara ◽  
...  
Keyword(s):  
Thin Film ◽  
Heavy Fermion ◽  
Film Growth ◽  
Thin Film Growth

Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Molecular Layer ◽  
Thin Film Growth ◽  
Cross Linking ◽  
Layer By Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Hybrid Thin Films ◽  
Enhanced Stability

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

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