Ion bombardment effects in plasma deposition of hydrogenated amorphous silicon carbide films: A comparative study of d.c. and r.f. discharges

1983 ◽  
Vol 109 (2) ◽  
pp. 145-158 ◽  
Author(s):  
Y. Catherine ◽  
A. Zamouche ◽  
J. Bullot ◽  
M. Gauthier
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