Ion bombardment effects in plasma deposition of hydrogenated amorphous silicon carbide films: A comparative study of d.c. and r.f. discharges
1998 ◽
Vol 37
(Part 1, No. 10)
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pp. 5480-5484
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2001 ◽
Vol 40
(Part 1, No. 12)
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pp. 6728-6731
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1983 ◽
Vol 59-60
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pp. 553-556
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2011 ◽
Vol 276
◽
pp. 012173
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2018 ◽
Vol 753
◽
pp. 320-328
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1982 ◽
Vol 21
(S1)
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pp. 297
◽
2013 ◽
Vol 270
◽
pp. 287-291
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