Chemical and electrical characteristics of low temperature plasma enhanced CVD silicon oxide films using Si2H6 and N2O
1997 ◽
Vol 15
(5)
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pp. 1843
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1995 ◽
Vol 24
(10)
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pp. 1507-1510
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2017 ◽
Vol 90
(11)
◽
pp. 1753-1759
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Keyword(s):
1989 ◽
Vol 36
(1-4)
◽
pp. 23-38
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Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):