Low temperature plasma enhanced chemical vapor deposition of silicon oxide films using disilane and nitrous oxide

Journal of Electronic Materials ◽

10.1007/bf02655469 ◽

1995 ◽

Vol 24 (10) ◽

pp. 1507-1510 ◽

Author(s):

Juho Song ◽

G. S. Lee ◽

P. K. Ajmera

Keyword(s):

Nitrous Oxide ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Silicon Oxide ◽

Oxide Films ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Temperature Plasma

Download Full-text

Low temperature plasma enhanced chemical vapor deposition of fluorinated silicon oxide films as an interlayer dielectric

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589337 ◽

1997 ◽

Vol 15 (5) ◽

pp. 1843 ◽

Author(s):

Juho Song

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Silicon Oxide ◽

Oxide Films ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Interlayer Dielectric ◽

Fluorinated Silicon Oxide

Download Full-text

Structural properties of low temperature plasma enhanced chemical vapor deposited silicon oxide films using disilane and nitrous oxide

Applied Physics Letters ◽

10.1063/1.114834 ◽

1995 ◽

Vol 67 (20) ◽

pp. 2986-2988 ◽

Author(s):

Juho Song ◽

G. S. Lee

Keyword(s):

Nitrous Oxide ◽

Low Temperature ◽

Structural Properties ◽

Silicon Oxide ◽

Oxide Films ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Chemical Vapor Deposited

Download Full-text

LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON FILMS ON DIFFERENT SUBSTRATES

High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes ◽

10.1615/hightempmatproc.v10.i3.90 ◽

2006 ◽

Vol 10 (3) ◽

pp. 457-466

Author(s):

A. Ya. Vinogradov ◽

A. N. Andronov ◽

A. B Ustinov ◽

K. E. Orlov ◽

A. S. Smirnov

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Low Temperature Plasma ◽

Temperature Plasma

Download Full-text

Low-Temperature Plasma-Enahanced Chemical Vapor Deposition of Crystal Silicon Film from Dichlorosilane

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.44 ◽

2001 ◽

Vol 40 (Part 1, No. 1) ◽

pp. 44-48 ◽

Author(s):

Haiping Liu ◽

Sughoan Jung ◽

Yukihiro Fujimura ◽

Chisato Fukai ◽

Hajime Shirai ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Silicon Film ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Crystal Silicon ◽

Temperature Plasma

Download Full-text

Study of boron nitride gate insulators grown by low temperature plasma enhanced chemical vapor deposition on InP

Applied Surface Science ◽

10.1016/0169-4332(89)90426-1 ◽

1989 ◽

Vol 39 (1-4) ◽

pp. 135-140 ◽

Author(s):

A. Bath ◽

P.J. van der Put ◽

J. Schoonman ◽

B. Lepley

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Boron Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Gate Insulators

Download Full-text

Film Characteristics of Low-Temperature Plasma-Enhanced Chemical Vapor Deposition Silicon Dioxide Using Tetraisocyanatesilane and Oxygen

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.6562 ◽

1998 ◽

Vol 37 (Part 1, No. 12A) ◽

pp. 6562-6568 ◽

Author(s):

Irman Idris ◽

Osamu Sugiura

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Film Characteristics

Download Full-text

Low temperature direct bonding mechanisms of tetraethyl orthosilicate based silicon oxide films deposited by plasma enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.4752258 ◽

2012 ◽

Vol 112 (6) ◽

pp. 063501 ◽

Author(s):

C. Sabbione ◽

L. Di Cioccio ◽

L. Vandroux ◽

J.-P. Nieto ◽

F. Rieutord

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Silicon Oxide ◽

Oxide Films ◽

Chemical Vapor ◽

Tetraethyl Orthosilicate ◽

Bonding Mechanisms

Download Full-text

Electron microscopy studies of crystallites in carbon nanopillars grown by low-temperature plasma-enhanced chemical-vapor deposition

Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques ◽

10.1134/s102745101701027x ◽

2017 ◽

Vol 11 (1) ◽

pp. 226-233 ◽

Author(s):

Ya. S. Grishina ◽

N. I. Borgardt ◽

R. L. Volkov ◽

D. G. Gromov ◽

S. V. Dubkov

Keyword(s):

Electron Microscopy ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Temperature Plasma

Download Full-text

High deposition rates for microcrystalline silicon with low temperature plasma enhanced chemical vapor deposition processes

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(98)00343-3 ◽

1998 ◽

Vol 227-230 ◽

pp. 861-865 ◽

Author(s):

P Hapke ◽

F Finger

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Microcrystalline Silicon ◽

Temperature Plasma ◽

Deposition Rates ◽

Deposition Processes

Download Full-text

Radio frequency magnetron sputtering of Au and low temperature plasma enhanced chemical vapor deposition of silicon nitride for ring ultramicroelectrodes fabrication

Journal of Electroanalytical Chemistry ◽

10.1016/j.jelechem.2006.07.030 ◽

2006 ◽

Vol 596 (2) ◽

pp. 124-130 ◽

Author(s):

Mingzhi Zhu ◽

Zhuangde Jiang ◽

Weixuan Jing ◽

Biao Yang

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Low Temperature ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Radio Frequency Magnetron Sputtering ◽

Temperature Plasma

Download Full-text