Structural properties of low temperature plasma enhanced chemical vapor deposited silicon oxide films using disilane and nitrous oxide

1995 ◽  
Vol 67 (20) ◽  
pp. 2986-2988 ◽  
Author(s):  
Juho Song ◽  
G. S. Lee
Keyword(s):  
Nitrous Oxide ◽  
Low Temperature ◽  
Structural Properties ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Chemical Vapor Deposited

scholarly journals Direct synthesis of graphene on silicon oxide by low temperature plasma enhanced chemical vapor deposition

Nanoscale ◽  
2018 ◽  
Vol 10 (26) ◽  
pp. 12779-12787 ◽  
Author(s):  
Roberto Muñoz ◽  
Lidia Martínez ◽  
Elena López-Elvira ◽  
Carmen Munuera ◽  
Yves Huttel ◽  
...  
Keyword(s):  
Low Temperature ◽  
Silicon Oxide ◽  
Direct Synthesis ◽  
Chemical Vapor ◽  
Native Oxide ◽  
Monolayer Graphene ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Graphene Films ◽  
Free Growth

Direct, low temperature, catalyst-free and transfer-free growth of monolayer graphene films on silicon wafer with a native oxide.

Structural Properties of Low Temperature Silicon Oxide Films Prepared by Remote Plasma‐Enhanced Chemical Vapor Deposition

1993 ◽  
Vol 140 (10) ◽  
pp. 3014-3018 ◽  
Author(s):  
A. Ortiz ◽  
J. C. Alonso ◽  
C. Falcony ◽  
M. H. Farias ◽  
L. Cota‐Araiza ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Structural Properties ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Remote Plasma
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