4128. Electron-beam lithographic pattern generation system. (USA)

Vacuum ◽  
1979 ◽  
Vol 29 (8-9) ◽  
pp. 331
1978 ◽  
Vol 15 (3) ◽  
pp. 874-877 ◽  
Author(s):  
A. M. Patlach ◽  
P. R. Jaskar ◽  
T. W. Studwell

1973 ◽  
Vol 10 (6) ◽  
pp. 1016-1019 ◽  
Author(s):  
B. P. Piwczyk ◽  
K. G. McQuhae

1975 ◽  
Vol 12 (6) ◽  
pp. 1246-1250 ◽  
Author(s):  
F. S. Ozdemir ◽  
C. R. Buckey ◽  
E. D. Wolf

2018 ◽  
Vol 9 ◽  
pp. 2581-2598 ◽  
Author(s):  
Lukas Keller ◽  
Michael Huth

Fabrication of three-dimensional (3D) nanoarchitectures by focused electron beam induced deposition (FEBID) has matured to a level that highly complex and functional deposits are becoming available for nanomagnetics and plasmonics. However, the generation of suitable pattern files that control the electron beam’s movement, and thereby reliably map the desired target 3D structure from a purely geometrical description to a shape-conforming 3D deposit, is nontrivial. To address this issue we developed several writing strategies and associated algorithms implemented in C++. Our pattern file generator handles different proximity effects and corrects for height-dependent precursor coverage. Several examples of successful 3D nanoarchitectures using different precursors are presented that validate the effectiveness of the implementation.


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