Low voltage scanning electron microscope with a combined multi-electrode retarding lens and detector

Vacuum ◽  
1996 ◽  
Vol 47 (10) ◽  
pp. 1159-1162 ◽  
Author(s):  
W Słówko ◽  
W Drzazga ◽  
J Felba
2019 ◽  
Vol 26 (4) ◽  
pp. 758-767 ◽  
Author(s):  
Yusuke Sakuda ◽  
Shunsuke Asahina ◽  
Takanari Togashi ◽  
Osamu Terasaki ◽  
Masato Kurihara

Abstract


Author(s):  
H. Todokoro ◽  
S. Yoneda ◽  
K. Yamaguchi

Recently, the low-voltage scanning electron microscope (LVSEM) has become the center of wide interest. This is because the SEM has become an indispensable instrument in the field of semiconductor production, where packing density is increasing and device geometry is shrinking to a few microns or less. However, application of the SEM in the semiconductor industries presents two serious problems: (i) electron radiation damage to transistor functions and (ii) charge-up of electrons on insulators. Various reports concerning electron radiation damage have been published (1,2,3), and it has been found that electron energy must be less than 2 kV to minimize radiation damage. Such low energy also avoids the charge-up effect. However, it is quite difficult to get a fine probe at such low energy due to insufficient source brightness and electron optical aberration.


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