Electrical properties of polyimide films implanted with nitrogen and argon

1989 ◽  
Vol 37-38 ◽  
pp. 720-723 ◽  
Author(s):  
T. Okada ◽  
S. Nishijima ◽  
K. Takahata ◽  
K. Katagiri ◽  
M. Kunori ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Polyimide Films

Effect Of Moisture On The Physical Properties Of Polyimide Films

1991 ◽  
Vol 227 ◽  
Author(s):  
Rajeevi Subramanian ◽  
Michael T. Pottiger ◽  
Jacqueline H. Morris ◽  
Joseph P. Curilla
Keyword(s):  
Dielectric Constant ◽  
Steady State ◽  
Electrical Properties ◽  
Relative Humidity ◽  
Quartz Crystal ◽  
Moisture Absorption ◽  
Relative Dielectric Constant ◽  
Moisture Uptake ◽  
Polyimide Films ◽  
Effect Of Moisture

ABSTRACTMoisture absorption and its effect on electrical properties were measured for several polyimides. A Quartz Crystal Microbalance (QCM) was used to investigate the moisture absorption in BPDA/PPD, PMDA/ODA, and BTDA//ODA/MPD polyimides. The steady-state moisture uptake in polyimides as a function of relative humidity (RH) was determined by exposing film samples to successively higher RH values ranging from 10 to 85% at 25°C. The isothermal moisture absorption as a function of percent RH was found to be nearly linear for all of the polyimides studied. The effect of moisture on the electrical properties of a BPDA/PPD polyimide was also investigated. The relative dielectric constant at 25 °C was found to be a linear function of the moisture absorbed.

Electrical Properties Of Thin Polyimide Films Prepared By Ionized Cluster Beam Deposition

1991 ◽  
Vol 227 ◽  
Author(s):  
Hyung-Jin Jung ◽  
Dong-Heon Lee ◽  
Jeon-Kook Lee ◽  
Chung-Nam Whang
Keyword(s):  
Electrical Properties ◽  
Cluster Beam ◽  
Thermal Curing ◽  
Polyimide Films ◽  
Capacitance Voltage ◽  
Silicon Structures ◽  
Clean Interface ◽  
Cluster Beam Deposition ◽  
Beam Deposition

ABSTRACTThe electrical properties of gold – polyimide - silicon structures were investigated experimentally by capacitance – voltage (C – V) measurement. Polyimide films were deposited on silicon substrate by using ionized cluster beam deposition (ICBD) of PMDA-ODA followed by in-situ thermal curing in N2 atmosphere. The resulting C – V plots show hysteresis, and it was believed to be due to the injection of carriers. The interface trap density is fairly low because of the clean interface provided by ICB technique.

Electrical properties of conventional polyimide films: Effects of chemical structure and water uptake

2006 ◽  
Vol 100 (1) ◽  
pp. 810-818 ◽  
Author(s):  
H. Deligöz ◽  
T. Yalcinyuva ◽  
S. Özgümüs ◽  
S. Yildirim
Keyword(s):  
Electrical Properties ◽  
Water Uptake ◽  
Chemical Structure ◽  
Polyimide Films

Polyimide Film for Generator Winding

2017 ◽  
pp. 15-56
Keyword(s):  
Electrical Properties ◽  
Water Absorption ◽  
Surface Charge ◽  
Breakdown Voltage ◽  
Dielectric Breakdown ◽  
Partial Discharge ◽  
Polyimide Film ◽  
Polyimide Films ◽  
Direct Fluorination ◽  
Voltage Frequency

Polyimide film is widely used in different areas due to its brilliant chemical and electrical properties. This chapter discusses effect of direct fluorination on surface charge and surface partial discharge of polyimide films. The influences of different fluorination time and voltage frequency are studied. The trap properties of polyimide film are analyzed. It is clear that the fluorination has changed the micro structure of the sample so that the trap property and the dissipation time are different. Further research focuses on the effects of water absorption on surface charge and dielectric breakdown of nanocomposite. The polyimide/Al2O3 film is selected as sample and the relation between water absorption and surface charge and breakdown voltage is discussed.

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