A new technique for deposition of titanium carbonitride films at room temperature by high energy density pulse plasma
1995 ◽
Vol 95
(1)
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pp. 55-58
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2004 ◽
Vol 384
(1-2)
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pp. 202-208
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2020 ◽
Vol 13
(2)
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pp. 562-570
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2020 ◽
Vol 124
(14)
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pp. 7615-7623
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2007 ◽
Vol 253
(11)
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pp. 4923-4927
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2018 ◽
Vol 383
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pp. 124-132
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