HIGH RATE REACTIVE SPUTTERING IN AN OPPOSED CATHODE CLOSED-FIELD UNBALANCED MAGNETRON SPUTTERING SYSTEM
1990 ◽
pp. 270-278
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1990 ◽
Vol 43-44
◽
pp. 270-278
◽
2019 ◽
Vol 367
◽
pp. 30-40
◽
1998 ◽
Vol 16
(5)
◽
pp. 2858-2869
◽
1998 ◽
Vol 98
(1-3)
◽
pp. 1370-1376
◽
2017 ◽
Vol 830
◽
pp. 012057
◽
2009 ◽
Vol 204
(6-7)
◽
pp. 978-982
◽
2003 ◽
Vol 171
(1-3)
◽
pp. 51-58
◽
1996 ◽
Vol 17
(4)
◽
pp. 215-219
◽
Keyword(s):
2009 ◽
Vol 204
(6-7)
◽
pp. 931-935
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