Development of a novel structure zone model relating to the closed-field unbalanced magnetron sputtering system

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581432 ◽

1998 ◽

Vol 16 (5) ◽

pp. 2858-2869 ◽

Author(s):

P. J. Kelly ◽

R. D. Arnell

Keyword(s):

Magnetron Sputtering ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Novel Structure ◽

Unbalanced Magnetron ◽

Sputtering System

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High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system

Surface and Coatings Technology ◽

10.1016/0257-8972(90)90080-v ◽

1990 ◽

Vol 43-44 ◽

pp. 270-278 ◽

Author(s):

William D. Sproul ◽

Paul J. Rudnik ◽

Michael E. Graham ◽

Suzanne L. Rohde

Keyword(s):

Magnetron Sputtering ◽

Reactive Sputtering ◽

High Rate ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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Scratch response and tribological behaviour of CrAlNiN coatings deposited by closed field unbalanced magnetron sputtering system

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2019.03.053 ◽

2019 ◽

Vol 367 ◽

pp. 30-40 ◽

Author(s):

Chuhan Sha ◽

Zhifeng Zhou ◽

Zonghan Xie ◽

Paul Munroe

Keyword(s):

Magnetron Sputtering ◽

Closed Field ◽

Tribological Behaviour ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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The determination of the current-voltage characteristics of a closed-field unbalanced magnetron sputtering system

Surface and Coatings Technology ◽

10.1016/s0257-8972(97)00260-0 ◽

1998 ◽

Vol 98 (1-3) ◽

pp. 1370-1376 ◽

Author(s):

P.J. Kelly ◽

R.D. Arnell

Keyword(s):

Magnetron Sputtering ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Current Voltage ◽

Current Voltage Characteristics ◽

Sputtering System

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HIGH RATE REACTIVE SPUTTERING IN AN OPPOSED CATHODE CLOSED-FIELD UNBALANCED MAGNETRON SPUTTERING SYSTEM

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50034-6 ◽

1990 ◽

pp. 270-278 ◽

Author(s):

WILLIAM D. SPROUL ◽

PAUL J. RUDNIK ◽

MICHAEL E. GRAHAM ◽

SUZANNE L. ROHDE

Keyword(s):

Magnetron Sputtering ◽

Reactive Sputtering ◽

High Rate ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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Mechanical Properties and Thermal Stability of CrSiN/AlN Multilayer Coatings Using a Closed-Field Unbalanced Magnetron Sputtering System

Journal of the Korean Physical Society ◽

10.3938/jkps.54.1109 ◽

2009 ◽

Vol 54 (3) ◽

pp. 1109-1114

Author(s):

Sung-Min Kim ◽

Gwang-Seok Kim ◽

Sang-Yul Lee ◽

Jae-Wook Lee ◽

Jeong-Yong Lee ◽

...

Keyword(s):

Mechanical Properties ◽

Thermal Stability ◽

Magnetron Sputtering ◽

Multilayer Coatings ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Thermal Stability Of ◽

Sputtering System

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Plasma source based on an unbalanced magnetron sputtering system

Journal of Physics Conference Series ◽

10.1088/1742-6596/830/1/012057 ◽

2017 ◽

Vol 830 ◽

pp. 012057 ◽

Author(s):

D P Borisov ◽

V A Slabodchikov ◽

V M Kuznetsov

Keyword(s):

Magnetron Sputtering ◽

Plasma Source ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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Thermal stability and electrochemical properties of CrZr–Si–N films synthesized by closed field unbalanced magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2009.05.030 ◽

2009 ◽

Vol 204 (6-7) ◽

pp. 978-982 ◽

Author(s):

YoungSu Kim ◽

GwangSeok Kim ◽

SangYul Lee

Keyword(s):

Thermal Stability ◽

Magnetron Sputtering ◽

Electrochemical Properties ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Microstructure and optical properties of MgO films synthesized by closed-field unbalanced magnetron sputtering with additional electron emission

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00235-4 ◽

2003 ◽

Vol 171 (1-3) ◽

pp. 51-58 ◽

Author(s):

Kyung H. Nam ◽

Jeon G. Han

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Electron Emission ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Novel engineering coatings produced by closed-field unbalanced magnetron sputtering

Materials & Design (1980-2015) ◽

10.1016/s0261-3069(97)00009-5 ◽

1996 ◽

Vol 17 (4) ◽

pp. 215-219 ◽

Author(s):

P.J. Kelly ◽

R.D. Arnell ◽

W. Ahmed ◽

A. Afzal

Keyword(s):

Magnetron Sputtering ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Microstructure, mechanical and tribological properties of Cr–C–N coatings deposited by pulsed closed field unbalanced magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2009.04.032 ◽

2009 ◽

Vol 204 (6-7) ◽

pp. 931-935 ◽

Author(s):

Z.L. Wu ◽

J. Lin ◽

J.J. Moore ◽

M.K. Lei

Keyword(s):

Magnetron Sputtering ◽

Tribological Properties ◽

Closed Field ◽

Mechanical And Tribological Properties ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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