Mechanical properties of TiN films deposited by changed-pressure r.f. sputtering

This paper focuses on investigating mechanical properties of micron-thick polycrystalline titanium nitride (TiN) films. We propose a new technique that can directly measure lateral strain of microscale crystalline specimen by X-ray diffraction (XRD) during tensile test. The XRD tensile test can provide not only Young’s modulus but also Poisson’s ratio of TiN films. Micron-thick TiN films were deposited onto both surfaces of single crystal silicon (Si) specimen by r.f. reactive magnetron sputtering. Young’s modulus and Poisson’s ratio of Si specimen obtained by XRD tensile tests were in good agreement with analytical values. TiN films deposited at Ar partial pressure of 0.7Pa had the average values of 290GPa and 0.36 for Young’s modulus and Poisson’s ratio. The elastic mechanical properties of TiN films gradually decreased down to 220GPa and 0.29 with increasing Ar partial pressure up to 1.0Pa, regardless of film thickness. The change in the film properties with Ar partial pressure would be attributed to the change in the film density.

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Mechanical Properties of TiN Films Deposited on Aluminium Substrates by Arc Ion Plating Method.

TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series A ◽

10.1299/kikaia.65.1635 ◽

1999 ◽

Vol 65 (635) ◽

pp. 1635-1641 ◽

Cited By ~ 1

Author(s):

Yasuhiro MIKI ◽

Tadashi TANIGUCHI ◽

Kazuya KUSAKA ◽

Takao HANABUSA ◽

Eiji MAITANI

Keyword(s):

Mechanical Properties ◽

Arc Ion Plating ◽

Tin Films ◽

Ion Plating ◽

Plating Method

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Effect of Sputtering Gas Pressure and Bias Voltage on Mechanical Properties of TiN Coating Deposited by DC Magnetron Sputtering

Recent Advances in Nondestructive Evaluation Techniques for Material Science and Industries ◽

10.1115/pvp2004-2826 ◽

2004 ◽

Author(s):

Hirotaka Tanabe ◽

Yoshio Miyoshi ◽

Tohru Takamatsu ◽

Hitoshi Awano ◽

Takaaki Yamano

Keyword(s):

Mechanical Properties ◽

Residual Stress ◽

Magnetron Sputtering ◽

Bias Voltage ◽

Adhesive Strength ◽

Gas Pressure ◽

Dc Magnetron Sputtering ◽

Tin Films ◽

Bombarding Energy ◽

Gas Pressures

The mechanical properties of TiN films deposited on carbon steel JIS S45C by reactive dc magnetron sputtering under three sputtering gas pressures, 0.5Pa, 0.8Pa, and 1.76Pa were investigated. The residual stress once increased and then decreased with increasing bias voltage at 0.5Pa and 0.8Pa, but increased monotonously at 1.76Pa. These variations could be explained by the variations of the bombarding energy of a sputtered ion at each gas pressure. The variations of hardness and toughness correlated with the variation of residual stress. The variation of adhesive strength also could be explained by the variation of the bombarding energy with a model proposed in this study. A specific wear rate was also investigated, and it was found that to increase not only the hardness but also the adhesive strength is necessary to improve the wear resistance of TiN films.

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Surface and bulk properties of boride/nitride nanoscale films

MRS Proceedings ◽

10.1557/proc-501-149 ◽

1997 ◽

Vol 501 ◽

Cited By ~ 2

Author(s):

R. A. Adrievski

Keyword(s):

Mechanical Properties ◽

Reactive Sputtering ◽

Inhomogeneous Deformation ◽

Test Results ◽

Bulk Properties ◽

Tin Films ◽

Nanoscale Films

ABSTRACTNanoscale TiB2/TiN films have been prepared by d.c. and r.f. magnetron non-reactive sputtering and examined by TEM, SAED, SEM, AES, XPS, XRD, AFM as well as nanoindentation. Attention has been focused on both bulk and surface physical-mechanical properties. The effect of the latter on the nanoindentaion test results seems to be very important. Two types of film fracture under a Vickers indentor connected with homogeneous and inhomogeneous deformation have been described.

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