Real time monitoring of filament-assisted chemically vapor deposited diamond by spectroscopic ellipsometry

Metallurgical Coatings and Thin Films 1991 ◽

10.1016/b978-0-444-89455-7.50073-3 ◽

1991 ◽

pp. 381-386

Author(s):

Yue Cong ◽

Ilsin An ◽

H.V. Nguyen ◽

K. Vedam ◽

R. Messier ◽

...

Keyword(s):

Real Time ◽

Spectroscopic Ellipsometry ◽

Real Time Monitoring ◽

Chemically Vapor Deposited

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Real time monitoring of filament-assisted chemically vapor deposited diamond by spectroscopic ellipsometry

Surface and Coatings Technology ◽

10.1016/0257-8972(91)90087-d ◽

1991 ◽

Vol 49 (1-3) ◽

pp. 381-386 ◽

Author(s):

Yue Cong ◽

Ilsin An ◽

H.V. Nguyen ◽

K. Vedam ◽

R. Messier ◽

...

Keyword(s):

Real Time ◽

Spectroscopic Ellipsometry ◽

Real Time Monitoring ◽

Chemically Vapor Deposited

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Real-time monitoring and process control in amorphous∕crystalline silicon heterojunction solar cells by spectroscopic ellipsometry and infrared spectroscopy

Applied Physics Letters ◽

10.1063/1.1850612 ◽

2005 ◽

Vol 86 (3) ◽

pp. 032112 ◽

Author(s):

Hiroyuki Fujiwara ◽

Michio Kondo

Keyword(s):

Solar Cells ◽

Infrared Spectroscopy ◽

Process Control ◽

Real Time ◽

Spectroscopic Ellipsometry ◽

Crystalline Silicon ◽

Real Time Monitoring ◽

Heterojunction Solar Cells ◽

Silicon Heterojunction Solar Cells

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Real time monitoring and control of wet etching of GaAs/Al[sub 0.3]Ga[sub 0.7]As using real time spectroscopic ellipsometry

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590869 ◽

1999 ◽

Vol 17 (5) ◽

pp. 2045 ◽

Author(s):

Sang-Jun Cho ◽

P. G. Snyder

Keyword(s):

Real Time ◽

Spectroscopic Ellipsometry ◽

Wet Etching ◽

Monitoring And Control ◽

Real Time Monitoring ◽

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Real-time monitoring and control of epitaxial semiconductor growth in a production environment by in situ spectroscopic ellipsometry

Thin Solid Films ◽

10.1016/s0040-6090(97)00870-5 ◽

1998 ◽

Vol 313-314 ◽

pp. 490-495 ◽

Author(s):

B Johs ◽

C Herzinger ◽

J.H Dinan ◽

A Cornfeld ◽

J.D Benson ◽

...

Keyword(s):

Real Time ◽

Spectroscopic Ellipsometry ◽

Monitoring And Control ◽

Production Environment ◽

Real Time Monitoring ◽

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Real-time monitoring of Si1–xGex heteroepitaxial growth using laser light scattering and spectroscopic ellipsometry

phys stat sol (a) ◽

10.1002/pssa.2211520110 ◽

1995 ◽

Vol 152 (1) ◽

pp. 95-102 ◽

Author(s):

C. Pickering ◽

R. T. Carline ◽

D. A. O. Hope ◽

D. J. Robbins

Keyword(s):

Light Scattering ◽

Real Time ◽

Spectroscopic Ellipsometry ◽

Laser Light ◽

Laser Light Scattering ◽

Heteroepitaxial Growth ◽

Real Time Monitoring

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Real-time monitoring of synchrotron-radiation-excited Si homoepitaxy on Si(100) by spectroscopic ellipsometry

Thin Solid Films ◽

10.1016/s0040-6090(97)00859-6 ◽

1998 ◽

Vol 313-314 ◽

pp. 430-434 ◽

Author(s):

H Akazawa

Keyword(s):

Synchrotron Radiation ◽

Real Time ◽

Spectroscopic Ellipsometry ◽

Real Time Monitoring

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Spectroscopic Ellipsometry. Real-Time Monitoring and Control of Thin-Film Growth Using Spectroscopic Ellipsometry.

Hyomen Kagaku ◽

10.1380/jsssj.18.695 ◽

1997 ◽

Vol 18 (11) ◽

pp. 695-699

Author(s):

Tadashi SAITOH

Keyword(s):

Thin Film ◽

Real Time ◽

Spectroscopic Ellipsometry ◽

Film Growth ◽

Thin Film Growth ◽

Monitoring And Control ◽

Real Time Monitoring ◽

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Fabrication of high quality polysilicon thin film on glass and its in situ real-time monitoring by spectroscopic ellipsometry

Proceedings of 1994 IEEE 1st World Conference on Photovoltaic Energy Conversion - WCPEC (A Joint Conference of PVSC, PVSEC and PSEC) ◽

10.1109/wcpec.1994.520210 ◽

2002 ◽

Author(s):

T. Akasaka ◽

Y. Tanaka ◽

I. Shimizu

Keyword(s):

Thin Film ◽

Real Time ◽

Spectroscopic Ellipsometry ◽

Real Time Monitoring ◽

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Real‐time monitoring of resonant‐tunneling diode growth using spectroscopic ellipsometry

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579817 ◽

1995 ◽

Vol 13 (3) ◽

pp. 733-739 ◽

Author(s):

F. G. Celii ◽

Y.‐C. Kao ◽

A. J. Katz ◽

T. S. Moise

Keyword(s):

Real Time ◽

Spectroscopic Ellipsometry ◽

Resonant Tunneling ◽

Resonant Tunneling Diode ◽

Real Time Monitoring ◽

Tunneling Diode

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Pulsed laser deposition with simultaneous in situ real-time monitoring of optical spectroscopic ellipsometry and reflection high-energy electron diffraction

Review of Scientific Instruments ◽

10.1063/1.4798621 ◽

2013 ◽

Vol 84 (4) ◽

pp. 043902 ◽

Author(s):

J. H. Gruenewald ◽

J. Nichols ◽

S. S. A. Seo

Keyword(s):

Electron Diffraction ◽

Pulsed Laser Deposition ◽

Real Time ◽

Spectroscopic Ellipsometry ◽

Pulsed Laser ◽

High Energy ◽

Laser Deposition ◽

High Energy Electron ◽

Real Time Monitoring

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