Y2O3 stabilized ZrO2 thin films deposited by electron beam evaporation: Structural, morphological characterization and laser induced damage threshold

2006 ◽  
Vol 253 (3) ◽  
pp. 1561-1565 ◽  
Author(s):  
Shi Gang Wu ◽  
Hong Ying Zhang ◽  
Guang Lei Tian ◽  
Zhi Lin Xia ◽  
Jian Da Shao ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Damage Threshold ◽  
Morphological Characterization ◽  
Electron Beam Evaporation ◽  
Laser Induced Damage

Optical, Structural and Laser-Induced Damage Threshold Properties of HfO 2 Thin Films Prepared by Electron Beam Evaporation

2005 ◽  
Vol 22 (5) ◽  
pp. 1246-1248 ◽  
Author(s):  
Zhan Mei-Qiong ◽  
Zhang Dong-Ping ◽  
Tan Tian-Ya ◽  
He Hong-Bo ◽  
Shao Jian-Da ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Damage Threshold ◽  
Electron Beam Evaporation ◽  
Laser Induced Damage

High laser-induced damage threshold HfO2 films prepared by ion-assisted electron beam evaporation

2005 ◽  
Vol 243 (1-4) ◽  
pp. 232-237 ◽  
Author(s):  
Dawei Zhang ◽  
Shuhai Fan ◽  
Yuanan Zhao ◽  
Weidong Gao ◽  
Jianda Shao ◽  
...  
Keyword(s):  
Electron Beam ◽  
Damage Threshold ◽  
Electron Beam Evaporation ◽  
High Laser ◽  
Laser Induced Damage

AlN thin films fabricated by ultra-high vacuum electron-beam evaporation with ammonia for silicon-on-insulator application

2005 ◽  
Vol 239 (3-4) ◽  
pp. 327-334 ◽  
Author(s):  
Ming Zhu ◽  
Peng Chen ◽  
Ricky K.Y. Fu ◽  
Weili Liu ◽  
Chenglu Lin ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
High Vacuum ◽  
Electron Beam Evaporation ◽  
Silicon On Insulator ◽  
Ultra High Vacuum
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