Effects of hydrogen and substrate temperature on the chemical bonding and optical properties of germanium carbon films deposited by reactive sputtering

2012 ◽  
Vol 258 (17) ◽  
pp. 6212-6216 ◽  
Author(s):  
Xing-Sen Che ◽  
Zheng-Tang Liu ◽  
Yang-Ping Li ◽  
Ning Wang
Keyword(s):  
Optical Properties ◽  
Substrate Temperature ◽  
Chemical Bonding ◽  
Reactive Sputtering ◽  
Carbon Films

scholarly journals Reproducibility of Properties of SnOxThin Films Prepared by Reactive Sputtering

1985 ◽  
Vol 11 (4) ◽  
pp. 271-280 ◽  
Author(s):  
Grazyna Beensh-Marchwicka ◽  
Lubomila Krol-Stepniewska
Keyword(s):  
Optical Properties ◽  
Substrate Temperature ◽  
Oxygen Content ◽  
Tin Dioxide ◽  
Reactive Sputtering ◽  
Argon Atmosphere ◽  
Low Energy ◽  
Electrical And Optical Properties

The preparation of tin dioxide films by low energy reactive sputtering of tin and tin-antimony (1-10% wt. Sb) in an oxygen – argon atmosphere is described. The dependences of oxygen content in the range from 0 to 50%, target compositions, substrate temperature of 300 K-573 K on minimum resistivity at satisfactory transmittance and on reproducibility are discussed. The correlation between the electrical and optical properties and the microstructure of the films is shown.

Influence of RF PACVD process parameters of diamond-like carbon films on optical properties and nano-hardness of the films

2008 ◽  
Vol 17 (7-10) ◽  
pp. 1655-1659 ◽  
Author(s):  
M. Smietana ◽  
J. Szmidt ◽  
M.L. Korwin-Pawlowski ◽  
N. Miller ◽  
A.A. Elmustafa
Keyword(s):  
Optical Properties ◽  
Process Parameters ◽  
Carbon Films ◽  
Diamond Like Carbon

Properties of carbon films deposited by pulsed laser vaporization from pyrolytic graphite

1989 ◽  
Vol 4 (5) ◽  
pp. 1238-1242 ◽  
Author(s):  
A. P. Malshe ◽  
S. M. Chaudhari ◽  
S. M. Kanetkar ◽  
S. B. Ogale ◽  
S. V. Rajarshi ◽  
...  
Keyword(s):  
Substrate Temperature ◽  
Pyrolytic Graphite ◽  
Carbon Films ◽  
Laser Vaporization ◽  
Film Properties ◽  
Amorphous Carbon Films ◽  
Resistivity Measurements ◽  
Laser Raman ◽  
Quartz Substrates ◽  
Substrate Temperatures

Amorphous carbon films have been deposited on silicon 〈111〉 and quartz substrates by pulsed ruby laser vaporization from pyrolytic graphite. Depositions have been carried out at different substrate temperatures, and the properties of the deposited carbon films have been studied using IR and UV–VIS transmission, ellipsometry, and laser-Raman spectroscopies. Chemical and electrical resistivity measurements have also been performed. It is shown that the film properties depend critically on the substrate temperature and that at the substrate temperature of 50 °C films with substantial proportion of sp3 hybridized orbitals are obtained.

scholarly journals Photoluminescence Activity of Neodymium-Doped Gallium Oxide Thin Films

2008 ◽  
Vol 1111 ◽  
Author(s):  
Celine Lecerf ◽  
Philippe Marie ◽  
Cedric Frilay ◽  
Julien Cardin ◽  
Xavier Portier
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Substrate Temperature ◽  
Gallium Oxide ◽  
Electronic Transitions ◽  
Oxide Thin Films ◽  
Structural And Optical Properties ◽  
Luminescence Efficiency

AbstractPhotoluminescence activity was observed for neodymium-doped gallium oxide thin films prepared by radiofrequency magnetron co-sputtering. Structural and optical properties of as-grown and annealed films were studied and photoluminescence activity was especially investigated. The most intense lines were associated to the 4F3/2  4I9/2 and 4F3/2  4I11/2 electronic transitions of Nd3+. The effects of deposition and treatment parameters such as the substrate temperature, the post anneal treatment or the neodymium content in the films were particularly examined with the aim to reach the best luminescence efficiency.

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