Pulsed direct current magnetron sputtered nanocrystalline tin oxide films
2012 ◽
Vol 258
(22)
◽
pp. 8902-8907
◽
A. Sivasankar Reddy
◽
N.M. Figueiredo
◽
A. Cavaleiro
2010 ◽
Vol 50
(9)
◽
pp. C106
◽
Bo-Huei Liao
◽
Chien-Cheng Kuo
◽
Pin-Jen Chen
◽
Cheng-Chung Lee
2006 ◽
Vol 500
(1-2)
◽
pp. 110-116
◽
Kee-Rong Wu
◽
Chieh-Hung Ting
◽
Wu-Chien Liu
◽
Chao-Hsien Lin
◽
Jiing-Kae Wu
2016 ◽
Vol 8
(3)
◽
pp. 622-626
◽
Min-Je Kim
◽
Pung-Keun Song
Paul G. Snyder
◽
Bhola N. De
◽
John A. .. WoolIam
◽
T. J. Coutts
◽
X. Li
2003 ◽
Vol 21
(4)
◽
pp. 1351-1354
◽
Shinji Takayama
◽
Toshifumi Sugawara
◽
Akira Tanaka
◽
Tokuji Himuro
2008 ◽
Vol 254
(20)
◽
pp. 6547-6553
◽
Tong Jun Liu
◽
Zheng Guo Jin
◽
Li Rui Feng
◽
Tao Wang
2002 ◽
Vol 59
(4)
◽
pp. 606-611
◽
C Liu
◽
T Matsutani
◽
N Yamamoto
◽
M Kiuchi
1985 ◽
Vol 129
(1-2)
◽
pp. 139-150
◽
Gar B. Hoflund
◽
Douglas A. Asbury
◽
Richard E. Gilbert
2009 ◽
Vol 469
(4-6)
◽
pp. 313-317
◽
Susmita Kundu
◽
Dipten Bhattacharya
◽
Jiten Ghosh
◽
Pintu Das
◽
Prasanta K. Biswas
2004 ◽
Vol 217
(1)
◽
pp. 97-103
◽
Tuquabo Tesfamichael
◽
Geoffrey Will
◽
Ian Kelly
◽
John Bell