High Crystallization of Ultra-Thin Indium Tin Oxide Films Prepared by Direct Current Magnetron Sputtering with Post-Annealing

2016 ◽  
Vol 8 (3) ◽  
pp. 622-626 ◽  
Author(s):  
Min-Je Kim ◽  
Pung-Keun Song
Keyword(s):  
Magnetron Sputtering ◽  
Direct Current ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Post Annealing ◽  
Direct Current Magnetron Sputtering ◽  
High Crystallization ◽  
Tin Oxide Films

Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering

2001 ◽  
Vol 40 (Part 1, No. 5A) ◽  
pp. 3364-3369 ◽  
Author(s):  
Wenli Deng ◽  
Taizo Ohgi ◽  
Hitoshi Nejo ◽  
Daisuke Fujita
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Tin Oxide Films

Preparation and characterization of tantalum-doped indium tin oxide films deposited by magnetron sputtering

2008 ◽  
Vol 58 (3) ◽  
pp. 203-206 ◽  
Author(s):  
Bo Zhang ◽  
Xianping Dong ◽  
Xiaofeng Xu ◽  
Jiansheng Wu
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Tin Oxide Films

Characteristics of indium tin oxide films deposited by r.f. magnetron sputtering

1995 ◽  
Vol 257 (1) ◽  
pp. 32-35 ◽  
Author(s):  
R.N. Joshi ◽  
V.P. Singh ◽  
J.C. McClure
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Tin Oxide Films
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