Successive deposition of layered titanium oxide/indium tin oxide films on unheated substrates by twin direct current magnetron sputtering

2006 ◽  
Vol 500 (1-2) ◽  
pp. 110-116 ◽  
Author(s):  
Kee-Rong Wu ◽  
Chieh-Hung Ting ◽  
Wu-Chien Liu ◽  
Chao-Hsien Lin ◽  
Jiing-Kae Wu
Keyword(s):  
Magnetron Sputtering ◽  
Titanium Oxide ◽  
Direct Current ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Direct Current Magnetron Sputtering ◽  
Tin Oxide Films

Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering

2001 ◽  
Vol 40 (Part 1, No. 5A) ◽  
pp. 3364-3369 ◽  
Author(s):  
Wenli Deng ◽  
Taizo Ohgi ◽  
Hitoshi Nejo ◽  
Daisuke Fujita
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Tin Oxide Films

Preparation and characterization of tantalum-doped indium tin oxide films deposited by magnetron sputtering

2008 ◽  
Vol 58 (3) ◽  
pp. 203-206 ◽  
Author(s):  
Bo Zhang ◽  
Xianping Dong ◽  
Xiaofeng Xu ◽  
Jiansheng Wu
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Tin Oxide Films

Characteristics of indium tin oxide films deposited by r.f. magnetron sputtering

1995 ◽  
Vol 257 (1) ◽  
pp. 32-35 ◽  
Author(s):  
R.N. Joshi ◽  
V.P. Singh ◽  
J.C. McClure
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Tin Oxide Films
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