Defects generated by MF magnetron sputtering and their influences on the electrical and optical properties of Al doped ZnO thin films

2015 ◽  
Vol 351 ◽  
pp. 392-400 ◽  
Author(s):  
Changshan Hao ◽  
Mandar M. Shirolkar ◽  
Jieni Li ◽  
Binjun Wu ◽  
Shiliu Yin ◽  
...  
2011 ◽  
Vol 306-307 ◽  
pp. 362-367
Author(s):  
Feng Lu ◽  
Yu Sun ◽  
Cheng Hai Xu

The high quality ZAO thin films were successfully produced by DC reaction magnetron sputtering technology. The XRD,electrical and optical properties of films are particular investigated. The results show that ZAO films are polycrystalline hexagonal wurtzite structure,and Al2O3 crystal phase are not found. At the same time,the high quality ZAO films with the minimum resistivity of 4.5x10-4Ω•㎝, the transmittance in visible region above 80% and the reflectivity in IR region above 70% are gained.


JOM ◽  
2015 ◽  
Vol 67 (4) ◽  
pp. 834-839 ◽  
Author(s):  
A. Guru Sampath Kumar ◽  
L. Obulapathi ◽  
T. Sofi Sarmash ◽  
D. Jhansi Rani ◽  
M. Maddaiah ◽  
...  

2014 ◽  
Vol 23 (4) ◽  
pp. 047805 ◽  
Author(s):  
Meng-Meng Cao ◽  
Xiao-Ru Zhao ◽  
Li-Bing Duan ◽  
Jin-Ru Liu ◽  
Meng-Meng Guan ◽  
...  

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