Properties of Al Doped ZnO Thin films by DC Reaction Magnetron Sputtering

2011 ◽  
Vol 306-307 ◽  
pp. 362-367
Author(s):  
Feng Lu ◽  
Yu Sun ◽  
Cheng Hai Xu
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Visible Region ◽  
Hexagonal Wurtzite Structure ◽  
Zno Thin Films ◽  
High Quality ◽  
Electrical And Optical Properties ◽  
Polycrystalline Hexagonal Wurtzite Structure ◽  
Doped Zno

The high quality ZAO thin films were successfully produced by DC reaction magnetron sputtering technology. The XRD，electrical and optical properties of films are particular investigated. The results show that ZAO films are polycrystalline hexagonal wurtzite structure，and Al2O3 crystal phase are not found. At the same time，the high quality ZAO films with the minimum resistivity of 4.5x10-4Ω•㎝, the transmittance in visible region above 80% and the reflectivity in IR region above 70% are gained.

Analysis of ZAO Thin Films by DC Reaction Magnetron Sputtereing

2011 ◽  
Vol 687 ◽  
pp. 585-590
Author(s):  
Feng Lu ◽  
Cheng Hai Xu ◽  
Li Shi Wen
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Visible Region ◽  
Hexagonal Wurtzite Structure ◽  
Wurtzite Structure ◽  
Crystal Phase ◽  
High Quality ◽  
Electrical And Optical Properties ◽  
Polycrystalline Hexagonal Wurtzite Structure

The high quality ZAO thin films were produced by DC reaction magnetron sputtering technology. The XRD, electrical and optical properties of ZAO thin films were particularly investigated. The results show that ZAO films are polycrystalline hexagonal wurtzite structure，and Al2O3 crystal phase are not found. At the same time，the high quality ZAO films with the minimum resistivity of 4.5x×10-4Ω·㎝, the transmittance in visible region above 80% and the reflectivity in IR region above 70% are gained.

Structural, Electrical and Optical Properties of Li-Doped ZnO Thin Films Influenced by Annealing Oxygen Pressure

2011 ◽  
Vol 299-300 ◽  
pp. 530-533
Author(s):  
Li Dan Tang ◽  
Bing Wang ◽  
Jian Zhong Wang
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Oxygen Pressure ◽  
Visible Region ◽  
Zno Thin Films ◽  
Zno Films ◽  
Electrical And Optical Properties ◽  
Axis Orientation ◽  
Surface Optical ◽  
Doped Zno

Li-doped ZnO thin films were grown on quartz substrates by radio frequency magnetron sputtering and In-situ annealing. The structural, electrical and optical properties of Li-doped ZnO films strongly depend on the annealing oxygen pressure. XRD and AFM analysis indicate that the ZnO films possess a good crystallinity with c-axis orientation, uniform thickness and dense surface. Optical transmission spectra show a high transmittance (~85%) in the visible region. Hall measurement demonstrates that ZnO films have p-type conduction with a Hall mobility of 5.0 cm2/Vs, resistivity of 0.97Ωcm and carrier concentration of 1.60×1017cm-3when annealing oxygen pressure is 1Pa.

Structural, Electrical and Optical Properties of Cd Doped ZnO Thin Films by Reactive dc Magnetron Sputtering

JOM ◽  
2015 ◽  
Vol 67 (4) ◽  
pp. 834-839 ◽  
Author(s):  
A. Guru Sampath Kumar ◽  
L. Obulapathi ◽  
T. Sofi Sarmash ◽  
D. Jhansi Rani ◽  
M. Maddaiah ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Zno Thin Films ◽  
Dc Magnetron Sputtering ◽  
Electrical And Optical Properties ◽  
Doped Zno
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