Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications

2018 ◽  
Vol 459 ◽  
pp. 596-605 ◽  
Author(s):  
Seungmin Yeo ◽  
Dip K. Nandi ◽  
R. Rahul ◽  
Tae Hyun Kim ◽  
Bonggeun Shong ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Direct Synthesis ◽  
Atomic Layer ◽  
High Quality ◽  
Layer Deposition

Al 2 O 3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

2019 ◽  
Vol 217 (8) ◽  
pp. 1900237
Author(s):  
Zhen Zhu ◽  
Saoussen Merdes ◽  
Oili M. E. Ylivaara ◽  
Kenichiro Mizohata ◽  
Mikko J. Heikkilä ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Thermal Plasma ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals Area‐Selective Growth of HfS 2 Thin Films via Atomic Layer Deposition at Low Temperature

2020 ◽  
Vol 7 (23) ◽  
pp. 2001493
Author(s):  
Yuanyuan Cao ◽  
Tobias Wähler ◽  
Hyoungwon Park ◽  
Johannes Will ◽  
Annemarie Prihoda ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Selective Growth ◽  
Layer Deposition

scholarly journals Nanocrystalline Ferroelectric BiFeO3 Thin Films by Low-Temperature Atomic Layer Deposition

2015 ◽  
Vol 27 (18) ◽  
pp. 6322-6328 ◽  
Author(s):  
Mariona Coll ◽  
Jaume Gazquez ◽  
Ignasi Fina ◽  
Zakariya Khayat ◽  
Andy Quindeau ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Bifeo3 Thin Films ◽  
Layer Deposition

Low temperature and high quality atomic layer deposition HfO2 coatings

2017 ◽  
Author(s):  
Alexander Pyymaki Perros ◽  
Perttu Sippola ◽  
Elisa Arduca ◽  
Leena-Sisko Johansson ◽  
Harri Lipsanen
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
High Quality ◽  
Layer Deposition

Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)2 and Tertiary Butyl Hydrazine

2017 ◽  
Vol 29 (15) ◽  
pp. 6502-6510 ◽  
Author(s):  
Katja Väyrynen ◽  
Kenichiro Mizohata ◽  
Jyrki Räisänen ◽  
Daniel Peeters ◽  
Anjana Devi ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tertiary Butyl ◽  
Low Resistivity ◽  
Layer Deposition

scholarly journals Atomic Layer Deposition of Crystalline MoS2 Thin Films: New Molybdenum Precursor for Low-Temperature Film Growth

2017 ◽  
Vol 4 (18) ◽  
pp. 1700123 ◽  
Author(s):  
Miika Mattinen ◽  
Timo Hatanpää ◽  
Tiina Sarnet ◽  
Kenichiro Mizohata ◽  
Kristoffer Meinander ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Atomic Layer ◽  
Layer Deposition

Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors

2014 ◽  
Vol 565 ◽  
pp. 19-24 ◽  
Author(s):  
Lauri Aarik ◽  
Tõnis Arroval ◽  
Raul Rammula ◽  
Hugo Mändar ◽  
Väino Sammelselg ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Thin Films ◽  
High Quality ◽  
Doped Tio2 ◽  
Layer Deposition
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