Al 2 O 3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

2019 ◽  
Vol 217 (8) ◽  
pp. 1900237
Author(s):  
Zhen Zhu ◽  
Saoussen Merdes ◽  
Oili M. E. Ylivaara ◽  
Kenichiro Mizohata ◽  
Mikko J. Heikkilä ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Thermal Plasma ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals MoS2 thin films from a (NtBu)2(NMe2)2Mo and 1-propanethiol atomic layer deposition process

2019 ◽  
Vol 37 (1) ◽  
pp. 010901 ◽  
Author(s):  
Berc Kalanyan ◽  
Ryan Beams ◽  
Michael B. Katz ◽  
Albert V. Davydov ◽  
James E. Maslar ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Atomic layer deposition process with TiF_4 as a precursor for depositing metal fluoride thin films

2008 ◽  
Vol 47 (13) ◽  
pp. C271 ◽  
Author(s):  
Tero Pilvi ◽  
Mikko Ritala ◽  
Markku Leskelä ◽  
Martin Bischoff ◽  
Ute Kaiser ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Metal Fluoride ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals Si surface passivation by Al2O3 thin films deposited using a low thermal budget atomic layer deposition process

2013 ◽  
Vol 102 (13) ◽  
pp. 131603 ◽  
Author(s):  
G. Seguini ◽  
E. Cianci ◽  
C. Wiemer ◽  
D. Saynova ◽  
J. A. M. van Roosmalen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Surface Passivation ◽  
Atomic Layer ◽  
Deposition Process ◽  
Thermal Budget ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition ◽  
Low Thermal Budget

Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology

Nanoscale ◽  
2018 ◽  
Vol 10 (18) ◽  
pp. 8615-8627 ◽  
Author(s):  
Akhil Sharma ◽  
Marcel A. Verheijen ◽  
Longfei Wu ◽  
Saurabh Karwal ◽  
Vincent Vandalon ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Low Temperature Plasma ◽  
Large Area ◽  
High Quality ◽  
Temperature Plasma ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

A low-temperature plasma enhanced atomic layer deposition process is demonstrated to synthesize high quality 2-D MoS2 films with tuneable morphology.

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