Low temperature and high quality atomic layer deposition HfO2 coatings

2017 ◽  
Author(s):  
Alexander Pyymaki Perros ◽  
Perttu Sippola ◽  
Elisa Arduca ◽  
Leena-Sisko Johansson ◽  
Harri Lipsanen
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
High Quality ◽  
Layer Deposition

Growth of Crystalline Gd2O3Thin Films with a High-Quality Interface on Si(100) by Low-Temperature H2O-Assisted Atomic Layer Deposition

2010 ◽  
Vol 132 (1) ◽  
pp. 36-37 ◽  
Author(s):  
Andrian P. Milanov ◽  
Ke Xu ◽  
Apurba Laha ◽  
Eberhard Bugiel ◽  
Ramadurai Ranjith ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
High Quality ◽  
Layer Deposition

Growing low-temperature, high-quality silicon-dioxide films by neutral-beam enhanced atomic-layer deposition

2019 ◽  
Vol 53 (1) ◽  
pp. 015204
Author(s):  
Hua-Hsuan Chen ◽  
Susumu Toko ◽  
Daisuke Ohori ◽  
Takuya Ozaki ◽  
Mitsuya Utsuno ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Dioxide ◽  
Atomic Layer ◽  
Neutral Beam ◽  
High Quality ◽  
Silicon Dioxide Films ◽  
Layer Deposition

Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology

Nanoscale ◽  
2018 ◽  
Vol 10 (18) ◽  
pp. 8615-8627 ◽  
Author(s):  
Akhil Sharma ◽  
Marcel A. Verheijen ◽  
Longfei Wu ◽  
Saurabh Karwal ◽  
Vincent Vandalon ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Low Temperature Plasma ◽  
Large Area ◽  
High Quality ◽  
Temperature Plasma ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

A low-temperature plasma enhanced atomic layer deposition process is demonstrated to synthesize high quality 2-D MoS2 films with tuneable morphology.

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