Room temperature synthesized highly conducting B-doped nanocrystalline silicon thin films on flexible polymer substrates by ICP-CVD

2022 ◽  
pp. 152499
Author(s):  
Chandralina Patra ◽  
Debajyoti Das
2020 ◽  
Vol 846 ◽  
pp. 156368
Author(s):  
Mohammad Shahnawaze Ansari ◽  
Mohd Hafiz Dzarfan Othman ◽  
Mohammad Omaish Ansari ◽  
Sana Ansari ◽  
Huda Abdullah ◽  
...  

2014 ◽  
Vol 609-610 ◽  
pp. 208-217 ◽  
Author(s):  
Hai Bin Pan ◽  
Jian Ning Ding ◽  
Guang Gui Cheng ◽  
Bao Guo Cao

This paper presents an experimental investigation of microstructure and piezoresistive properties of phosphorus-doped hydrogenated nanocrystalline silicon (nc-Si:H) thin films. The phosphorus-doped nc-Si:H thin films (5% doping ratio of PH3 to SiH4) were deposited by plasma enhanced chemical vapor deposition (PECVD) technique. The microstructure and surface morphology of the deposited thin films was characterized and analyzed with Raman spectroscopy and atomic force microscopy (AFM), respectively. The piezoresistive properties of the deposited thin films were investigated with a designed four-point bending-based evaluation system. In addition, the influence of temperature on the piezoresistive properties of these thin films was evaluated with the temperature coefficient of resistance (TCR) measurements from room temperature up to 80°C. The experimental results show that phosphorus-doped nc-Si:H thin films prepared by PECVD technique are a two-phase material that constitutes of nanocrystalline silicon and amorphous silicon, and they present a granular structure composed of homogeneously scattered nanoclusters formed by nanocrystalline silicon grains (6nm). Moreover, phosphorus-doped nc-Si:H thin films exhibit negative GF at room temperature and show good thermal stability from room temperature up to 80°C, and the value of GF and TCR is about-31 and-509ppm/°C, respectively. These features could make phosphorus-doped nc-Si:H thin films act as a promising material for piezoresistive-based MEMS sensor.


1998 ◽  
Vol 536 ◽  
Author(s):  
A. B. Pevtsov ◽  
N. A. Feoktistov ◽  
V. G. Golubev

AbstractThin (<1000 Å) hydrogenated nanocrystalline silicon films are widely used in solar cells, light emitting diodes, and spatial light modulators. In this work the conductivity of doped and undoped amorphous-nanocrystalline silicon thin films is studied as a function of film thickness: a giant anisotropy of conductivity is established. The longitudinal conductivity decreases dramatically (by a factor of 109 − 1010) as the layer thickness is reduced from 1500 Å to 200 Å, while the transverse conductivity remains close to that of a doped a- Si:H. The data obtained are interpreted in terms of the percolation theory.


2002 ◽  
Vol 403-404 ◽  
pp. 91-96 ◽  
Author(s):  
C. Gonçalves ◽  
S. Charvet ◽  
A. Zeinert ◽  
M. Clin ◽  
K. Zellama

1997 ◽  
Vol 46 (10) ◽  
pp. 2015
Author(s):  
CHEN GUO ◽  
GUO XIAO-XU ◽  
ZHU MEI-FANG ◽  
SUN JING-LAN ◽  
XU HUAI-ZHE ◽  
...  

1997 ◽  
Vol 12 (12) ◽  
pp. 3386-3392 ◽  
Author(s):  
A. A. Seraphin ◽  
E. Werwa ◽  
K. D. Kolenbrander

We demonstrate the effect of particle size and quantum confinement on the luminescence properties of nanoscale silicon thin films. Thin films of agglomerated silicon nanoparticles are synthesized using pulsed laser ablation supersonic expansion. Following deposition, standard semiconductor processing techniques are employed to reduce the nanoparticle size. Films are oxidized both in air and chemically to reduce the silicon core dimensions, resulting in a shift of the luminescence emission peak to shorter wavelengths. Removal of the oxide using hydrofluoric acid (HF) results in further blueshifting of the luminescence, as does subsequent reoxidation in air and using nitric acid. The luminescence properties of samples are also studied as a function of excitation intensity. For room temperature excitation with a pulsed 355 nm source, a saturation of the photoluminescence intensity at high excitation intensity is observed, along with a blueshift of the peak PL wavelength. This behavior is found to persist at reduced temperature. A saturation of PL intensity, but no blueshift, is observed for high excitation intensity using a cw 488 nm source at room temperature. At reduced temperatures, no saturation of emission intensity occurs for high intensity 488 nm cw excitation. Both the irreversible shifting of the peak PL wavelength with size reducing treatments and the PL behavior at high excitation intensities indicate that quantum confinement determines the luminescence wavelength.


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